公开(公告)号：US20220121111A1

公开(公告)日：2022-04-21

申请号：US17548944

申请日：2021-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Mária PÉTER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20180356738A1

公开(公告)日：2018-12-13

申请号：US15736297

申请日：2016-04-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Antonius Franciscus Johannes DE GROOT ,  Theo Anjes Maria RUIJL ,  Christiaan Louis VALENTIN ,  Christan WERNER

IPC: G03F7/20 ,  H01L21/68 ,  H01L21/027 ,  G03B27/58

CPC classification number: G03F7/70758 ,  G03B27/58 ,  G03F7/70725 ,  G03F7/70775 ,  H01L21/027 ,  H01L21/68

Abstract: The present invention relates to a movable support (1) configured to support an object, comprising: a support plane (2) to support the object, an actuator assembly to move the movable support in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to the support plane, wherein the actuator assembly comprises: a first actuator (3) configured to exert a first actuation force (F1) in a first actuation direction (A1), said first actuation direction being parallel to the support plane, a second actuator (4) configured to exert a second actuation force (F2) in a second actuation direction (A2), said second actuation direction being parallel to the support plane, wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other.

公开(公告)号：US20240027893A1

公开(公告)日：2024-01-25

申请号：US18220799

申请日：2023-07-11

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Mária PÉTER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20200050115A1

公开(公告)日：2020-02-13

申请号：US16343569

申请日：2017-09-27

Applicant: ASML NETHERLANDS B.V,

Inventor： Pim Jozef Hendrik DUIJSENS ,  Antonius Franciscus Johannes DE GROOT

IPC: G03F7/20 ,  H01L21/68 ,  H02K41/03

Abstract: A motor assembly includes linear motors, each linear motor configured to generate a driving force in a driving direction and each having a first electromagnetic assembly and a second electromagnetic assembly, configured to co-operate with the first electromagnetic assembly, for generating the driving force, wherein the first electromagnetic assembly and the second electromagnetic assembly face each other and define a gap between each other in a direction perpendicular to the driving direction. A first interface connects the first electromagnetic assemblies to a common member. A second interface connects the second electromagnetic assemblies to the object to be driven. The first and second electromagnetic assemblies are stacked in the direction perpendicular to the driving direction, and the first and/or second interface is configured to enable a relative displacement between the respective first electromagnetic assemblies and the second electromagnetic assemblies in the direction perpendicular to the driving direction.

公开(公告)号：US20200209736A1

公开(公告)日：2020-07-02

申请号：US16614815

申请日：2018-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Flendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Maria PETER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64 ,  G03F7/20

Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20190219932A1

公开(公告)日：2019-07-18

申请号：US16332002

申请日：2017-08-31

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Krijn Frederik BUSTRAAN ,  Yang-Shan HUANG ,  Antonius Franciscus Johannes DE GROOT ,  Minkyu KIM ,  Jasper Anne Frido Marikus SIMONS ,  Theo Anjes Maria RUIJL ,  Ronald Josephus Maria LAMERS

IPC: G03F7/20

CPC classification number: G03F7/70766 ,  G03F7/70725 ,  G03F7/70758

Abstract: A positioning system for positioning an object. The positioning system includes a stage, a balance mass and an actuator system. The stage is for holding the object. The actuator system is arranged to drive the stage in a first direction while driving the balance mass in a second direction opposite to the first direction. The stage is moveable in the first direction in a movement range. When the stage is moving in the first direction and is at an end of the movement range, the positioning system is arranged to collide the stage frontally into the balance mass.

公开(公告)号：US20190113853A1

公开(公告)日：2019-04-18

申请号：US16092021

申请日：2017-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes ONVLEE ,  Antonius Franciscus Johannes DE GROOT ,  Wim SYMENS ,  David Ferdinand VLES

IPC: G03F7/20

Abstract: A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.

公开(公告)号：US20170199469A1

公开(公告)日：2017-07-13

申请号：US15324264

申请日：2015-07-10

Applicant: ASML Netherlands B.V.

Inventor： Johannes Adrianus Antonius Theodorus DAMS ,  Dirk Hendrikus Marinus ENGELEN ,  Peter Michel Silvester Maria HEIJMANS ,  Simon Bernardus Cornelis Maria MARTENS ,  Hans BUTLER ,  Antonius Franciscus Johannes DE GROOT

IPC: G03F7/20 ,  H02K41/03 ,  H02K11/30 ,  H02K11/21 ,  H02K15/06

CPC classification number: G03F7/70758 ,  H02K11/21 ,  H02K11/30 ,  H02K15/06 ,  H02K41/031 ,  H02K2201/18

Abstract: An actuator includes coil assemblies arranged in an array, wherein each coil assembly defines a core chamber having a core chamber height; and at least one magnetic member that extends partly along the core chamber height of the core chamber of a corresponding at least one coil assembly, wherein the at least one magnetic member is made of a magnetic material. A shape of the at least one magnetic member, a size of the at least one magnetic member, a position of the at least one magnetic member and/or the magnetic material of the at least one magnetic member may be selected so as to control one or more parameters of the actuator.

公开(公告)号：US20220082945A1

公开(公告)日：2022-03-17

申请号：US17418719

申请日：2019-11-29

Applicant: ASML Netherlands B.V.

Inventor： Andrey NIKIPELOV ,  Antonius Franciscus Johannes DE GROOT ,  Mariya NEKLYUDOVA

IPC: G03F7/20

Abstract: A method of producing a substrate holder for use in a lithographic apparatus, the substrate holder comprising a main body having a main body surface, wherein the method includes the steps of: coating at least part of the main body with a layer of a first coating material; and treating a plurality of discrete regions of the first coating material with laser irradiation to selectively convert said first coating material in said regions to a second coating material having a different structure or density.

公开(公告)号：US20210263431A1

公开(公告)日：2021-08-26

申请号：US17269909

申请日：2019-07-16

Applicant: ASML Netherlands B.V.

Inventor： Johannes Petrus Martinus Bernardus VERMEULEN ,  Luc Leonardus Adrianus Martinus MEULENDIJKS ,  Antonius Franciscus Johannes DE GROOT ,  Johannes Adrianus Cornelis Maria PIJNENBURG

IPC: G03F7/20

Abstract: The invention provides a substrate support for supporting a substrate, comprising: a support body, which support body comprises a support surface for supporting the substrate, a rotary dither device, which is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis which is perpendicular to the support surface.