公开(公告)号：US20190171113A1

公开(公告)日：2019-06-06

申请号：US16270958

申请日：2019-02-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Takeshi KANEKO ,  Robbert Jan VOOGD ,  Gregory Martin Mason CORCORAN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Johan Gertrudis Cornelis KUNNEN ,  Ramin BADIE

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

公开(公告)号：US20240069454A1

公开(公告)日：2024-02-29

申请号：US18280266

申请日：2022-02-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Cristina CARESIO ,  Tabitha Wangari KINYANJUI ,  Andrey Valerievich ROGACHEVSKIY ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Raymund CENTENO ,  Jan Arie DEN BOER ,  Viktor TROGRLIC

IPC: G03F9/00

CPC classification number: G03F9/7034 ,  G03F9/7092

Abstract: A method of processing a data set including equispaced and/or non-equispaced data samples is disclosed. The method includes filtering of the data, wherein a kernel defined by a probability density function is convoluted over samples in the data set to perform a weighted average of the samples at a plurality of positions across the data set, and wherein a first order regression is applied to the filtered data to provide a processed data output.

公开(公告)号：US20160202618A1

公开(公告)日：2016-07-14

申请号：US15078814

申请日：2016-03-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Takeshi KANEKO ,  Robbert Jan VOOGD ,  Gregory Martin Mason CORCORAN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Johan Gertrudis Cornelis KUNNEN ,  Ramin BADIE

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

Abstract translation: 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。

公开(公告)号：US20170363964A1

公开(公告)日：2017-12-21

申请号：US15694519

申请日：2017-09-01

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Haico Victor KOK ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Johannes Antonius Maria VAN DE WAL ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Robbert-Jan VOOGD ,  Jan Steven Christiaan WESTERLAKEN ,  Johannes Hubertus Antonius VAN DE RIJDT ,  Allard Eelco KOOIKER ,  Wilhelmina Margareta Jozef HURKENS-MERTENS ,  Yohann Bruno Yvon TEILLET

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70666 ,  G03F7/70858 ,  G03F7/70891

Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.

公开(公告)号：US20250138440A1

公开(公告)日：2025-05-01

申请号：US19009394

申请日：2025-01-03

Applicant: ASML NETHERLANDS B.V

Inventor： Nicolaas TEN KATE ,  Joost Jeroen OTTENS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Robbert Jan VOOGD ,  Giovanni Francisco NINO ,  Marinus Jan REMIE ,  Johannes Henricus Wilhelmus JACOBS ,  Thibault Simon Mathieu LAURENT ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/00

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US20230244153A1

公开(公告)日：2023-08-03

申请号：US18000299

申请日：2021-04-19

Applicant: ASML Netherlands B.V.

Inventor： Andrey Valerievich ROGACHEVSKIY ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Doru Cristian TORUMBA ,  Arjan GIJSBERTSEN ,  Cristina CARESIO ,  Raymund CENTENO ,  Tabitha Wangari KINYANJUI ,  Jan Arie DEN BOER

IPC: G03F9/00 ,  G06T7/246 ,  G01C5/00

CPC classification number: G03F9/7034 ,  G06T7/246 ,  G01C5/00 ,  G03F9/7046 ,  G03F9/7092 ,  G03F9/7026 ,  G03F9/7019

Abstract: The present invention provides a method for calculating a corrected substrate height map of a first substrate using a height level sensor. The method comprises: sampling the first substrate by means of the height level sensor with the first substrate moving with a first velocity, wherein the first velocity is a first at least partially non-constant velocity of the first substrate with respect to the height level sensor, to generate a first height level data, generating a first height map based on the first height level data, and calculating a corrected substrate height map by subtracting a correction map from the first height map, wherein the correction map is calculated from the difference between a first velocity height map and a second velocity height map.

公开(公告)号：US20220206400A1

公开(公告)日：2022-06-30

申请号：US17698100

申请日：2022-03-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas TEN KATE ,  Joost Jeroen OTTENS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Robbert Jan VOOGD ,  Giovanni Francisco NINO ,  Marinus Jan REMIE ,  Johannes Henricus Wilhelmus JACOBS ,  Thibault Simon Mathieu LAURENT ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/20

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.