公开(公告)号：US20170315454A1

公开(公告)日：2017-11-02

申请号：US15629399

申请日：2017-06-21

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Wilhelmus Franciscus Johannes SIMONS ,  Martijn HOUBEN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Rogier Hendrikus Magdalena CORTIE ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Gerben PIETERSE ,  Siegfried Alexander TROMP ,  Theodorus Wilhelmus POLET ,  Jim Vincent OVERKAMP ,  Van Vuong VY

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20180292762A1

公开(公告)日：2018-10-11

申请号：US16008355

申请日：2018-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Nicolaas TEN KATE ,  Joost Jeroen OTTENS ,  Marcel BECKERS ,  Marco POLIZZI ,  Michel RIEPEN ,  Anthonie KUIJPER ,  Koen STEFFENS ,  Adrianes Johannes BAETEN ,  Anca Mihaela ANTONEVICI

IPC: G03F7/20 ,  B01D19/00

Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

公开(公告)号：US20170242348A1

公开(公告)日：2017-08-24

申请号：US15589705

申请日：2017-05-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Michel RIEPEN ,  Christiaan Alexander HOOGENDAM ,  Paulus Martinus Maria LIEBREGTS ,  Ronald VAN DER HAM ,  Wilhelmus Franciscus Johannes SIMONS ,  Daniël Jozef Maria DIRECKS ,  Paul Petrus Joannes BERKVENS ,  Eva MONDT ,  Gert-Jan Gerardus Johannes Thomas BRANDS ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Mathieus Anna Karel VAN LIEROP ,  Christophe DE METSENAERE ,  Marcio Alexandre Cano MIRANDA ,  Patrick Johannes Wilhelmus SPRUYTENBURG ,  Joris Johan Anne-Marie VERSTRAETE ,  Franciscus Johannes Joseph JANSSEN

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

公开(公告)号：US20190171113A1

公开(公告)日：2019-06-06

申请号：US16270958

申请日：2019-02-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Takeshi KANEKO ,  Robbert Jan VOOGD ,  Gregory Martin Mason CORCORAN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Johan Gertrudis Cornelis KUNNEN ,  Ramin BADIE

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

公开(公告)号：US20180267412A1

公开(公告)日：2018-09-20

申请号：US15918478

申请日：2018-03-12

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Wilhelmus Franciscus Johannes SIMONS ,  Martijn HOUBEN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Rogier Hendrikus Magdalena CORTIE ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Gerben PIETERSE ,  Siegfried Alexander TROMP ,  Theodorus Wilhelmus POLET ,  Jim Vincent OVERKAMP ,  Van Vuong VY

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20240192607A1

公开(公告)日：2024-06-13

申请号：US17641206

申请日：2020-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Wilhelmus POLET ,  Koen STEFFENS ,  Ronald VAN DER HAM ,  Gerben PIETERSE ,  Erik Henricus Egidius Catharina EUMMELEN ,  Francis FAHRNI

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70733 ,  G03F7/70991

Abstract: A fluid handling system for wetting a substrate irradiated by radiation. The fluid handling system include a first device to confine a first liquid to a first space between the first device and the substrate. The first device includes a first liquid supply member to provide the first liquid to the first space and an extraction member to remove liquid. The fluid handling system further includes a second device including a second liquid supply member to provide a second liquid to a second space between the second device and the substrate, wherein there is a gap on the surface of the substrate between the first and second liquids. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer, and is configured to provide the first and second liquids on the substrate simultaneously.

公开(公告)号：US20180210350A1

公开(公告)日：2018-07-26

申请号：US15320300

申请日：2015-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Gerben PIETERSE ,  Theodorus Wilhelmus POLET ,  Johannes Jacobus Matheus BASELMANS ,  Willem Jan BOUMAN ,  Theodorus Marinus MODDERMAN ,  Cornelius Maria ROPS ,  Bart SMEETS ,  Koen STEFFENS ,  Ronald VAN DER HAM

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70316 ,  G03F7/70341

Abstract: An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

公开(公告)号：US20150015857A1

公开(公告)日：2015-01-15

申请号：US14498883

申请日：2014-09-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Nicolaas TEN KATE ,  Joost Jeroen OTTENS ,  Marcel BECKERS ,  Marco POLIZZI ,  Michel RlEPEN ,  Anthonie KUIJPER ,  Koen STEFFENS ,  Adrianes Johannes BAETEN ,  Anca Mihaela ANTONEVICI

IPC: G03F7/20 ,  B01D19/00

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

Abstract translation: 描述了一种浸没式光刻设备，其中通过使富液体流优先沿着表面流动，将两相流分离成富含液体的富气流。

公开(公告)号：US20200050116A1

公开(公告)日：2020-02-13

申请号：US16657267

申请日：2019-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Koert STAVENGA ,  Sergei SHULEPOV ,  Koen STEFFENS ,  Matheus Ana Karel VAN LIEROP ,  Samuel Bertrand Dominique DAVID ,  David BESSEMS

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/68

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

公开(公告)号：US20170219939A1

公开(公告)日：2017-08-03

申请号：US15328376

申请日：2015-06-26

Applicant: ASML Netherlands B.V.

Inventor： Theodorus Wilhelmus POLET ,  Johannes Jacobus BASELMANS ,  Willem Jan BOUMAN ,  Han Henricus Aldegonda LEMPENS ,  Theodorus Marinus MODDERMAN ,  Cornelius Maria ROPS ,  Bart SMEETS ,  Koen STEFFENS ,  Ronald VAN DER HAM

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

Abstract: An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.