公开(公告)号：US20200379359A1

公开(公告)日：2020-12-03

申请号：US16988766

申请日：2020-08-10

Applicant: ASML Netherlands B.V.

Inventor： Hendrik Jan Hidde SMILDE ,  Bastiaan Onne FAGGINGER AUER ,  Davit HARUTYUNYAN ,  Patrick WARNAAR

IPC: G03F7/20 ,  G01B9/04 ,  G03F9/00

Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.

公开(公告)号：US20190204180A1

公开(公告)日：2019-07-04

申请号：US16214196

申请日：2018-12-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Mariya Vyacheslavivna MEDVEDYEVA ,  Maria Isabel DE LA FUENTE VALENTIN ,  Satej Subhash KHEDEKAR ,  Bert VERSTRAETEN ,  Bastiaan Onne FAGGINGER AUER

IPC: G01M11/02 ,  G01B11/00

CPC classification number: G01M11/02 ,  G01B11/002 ,  G01B2210/56 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633

Abstract: Methods for processing data from a metrology process and for obtaining calibration data are disclosed. In one arrangement, measurement data is obtained from a metrology process. The metrology process includes illuminating a target on a substrate with measurement radiation and detecting radiation redirected by the target. The measurement data includes at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method further includes analyzing the at least a component of the detected pupil representation to determine either or both of a position property and a focus property of a radiation spot of the measurement radiation relative to the target.

公开(公告)号：US20180173113A1

公开(公告)日：2018-06-21

申请号：US15842958

申请日：2017-12-15

Applicant: ASML Netherlands B.V.

Inventor： Jolanda Theodora Josephina SCHMETZ-SCHAGEN ,  Hugo Augustinus Joseph CRAMER ,  Armand Eugene Albert KOOLEN ,  Bastiaan Onne FAGGINGER AUER

IPC: G03F7/20 ,  G01B11/02 ,  G01M11/02

CPC classification number: G03F7/70641 ,  G01B11/028 ,  G01M11/0264 ,  G01N21/956 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7026

Abstract: A method for monitoring a characteristic of illumination from a metrology apparatus, the method comprising: using the metrology apparatus to acquire a pupil image at different focus settings of the metrology apparatus; and calculating an asymmetry value for each acquired pupil image; wherein each pupil image is acquired on at least one edge of a target of a substrate.

公开(公告)号：US20190250094A1

公开(公告)日：2019-08-15

申请号：US16268564

申请日：2019-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh PANDEY ,  Zili ZHOU ,  Gerbrand VAN DER ZOUW ,  Arie Jeffrey DEN BOEF ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Armand Eugene Albert KOOLEN ,  Hugo Augustinus Joseph CRAMER ,  Paul Christiaan HINNEN ,  Martinus Hubertus Maria VAN WEERT ,  Anagnostis TSIATMAS ,  Shu-jin WANG ,  Bastiaan Onne FAGGINGER AUER ,  Alok VERMA

IPC: G01N21/21 ,  G01N21/88 ,  G03F7/20

CPC classification number: G01N21/21 ,  G01N21/8806 ,  G01N2021/8848 ,  G03F7/70191 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633

Abstract: An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.

公开(公告)号：US20190094712A1

公开(公告)日：2019-03-28

申请号：US16185062

申请日：2018-11-09

Applicant: ASML Netherlands B.V.

Inventor： Hendrik Jan Hidde SMILDE ,  Bastiaan Onne FAGGINGER AUER ,  Davit HARUTYUNYAN ,  Patrick WARNAAR

IPC: G03F7/20 ,  G03F9/00 ,  G01B9/04 ,  G01N21/88

CPC classification number: G03F7/70625 ,  G01B9/04 ,  G01B2210/56 ,  G01N2021/8822 ,  G03F7/70633 ,  G03F7/70641 ,  G03F9/7092

Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.

公开(公告)号：US20230288815A1

公开(公告)日：2023-09-14

申请号：US18019968

申请日：2021-07-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Siebe Tjerk DE ZWART ,  Remco DIRKS ,  Gaurav NANDA ,  Bastiaan Onne FAGGINGER AUER

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70525 ,  G03F7/70504 ,  G03F7/706839 ,  G03F7/706845

Abstract: Methods and systems for determining a mapped intensity metric are described. Determining the mapped intensity metric includes determining an intensity metric for a manufacturing system. The intensity metric is determined based on a reflectivity of a location on a substrate and a manufacturing system characteristic. Determining the mapped intensity metric also includes determining a mapped intensity metric for a reference system. The reference system has a reference system characteristic. The mapped intensity metric is determined based on the intensity metric, the manufacturing system characteristic, and the reference system characteristic, to mimic determination of the intensity metric for the manufacturing system using the reference system. In some embodiments, the reference system is virtual, and the manufacturing system is physical.

公开(公告)号：US20190242782A1

公开(公告)日：2019-08-08

申请号：US16253338

申请日：2019-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Mariya Vyacheslavivna MEDVEDYEVA ,  Anagnostis TSIATMAS ,  Hugo Augustinus Joseph CRAMER ,  Martinus Hubertus Maria VAN WEERT ,  Bastiaan Onne FAGGINGER AUER ,  Xiaoxin SHANG ,  Johan Maria VAN BOXMEER ,  Bert VERSTRAETEN

IPC: G01M11/02

CPC classification number: G01M11/0228 ,  G02B7/38 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641

Abstract: Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiation redirected by the target. The applications of the metrology process include applications at different nominal focus heights. The measurement data includes, for each application of the metrology process, at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal focus height for the metrology process using the obtained measurement data.