公开(公告)号：US20170176328A1

公开(公告)日：2017-06-22

申请号：US15378962

申请日：2016-12-14

Applicant: ASML Netherlands B.V.

Inventor： Martin Jacobus Johan JAK ,  Armand Eugene Albert KOOLEN ,  Gerbrand VAN DER ZOUW ,  Dirk Karel Margaretha BRODDIN

IPC: G01N21/47 ,  G03F7/20 ,  G01N21/95

Abstract: An inspection apparatus includes an optical system, which has a radiation beam delivery system for delivering radiation to a target, and a radiation beam collection system for collecting radiation after scattering from the target. Both the delivery system and the collection system comprise optical components that control the characteristics of the radiation and the collected radiation. By controlling the characteristics of one or both of the radiation and collected radiation, the depth of focus of the optical system may be increased.

公开(公告)号：US20190250094A1

公开(公告)日：2019-08-15

申请号：US16268564

申请日：2019-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh PANDEY ,  Zili ZHOU ,  Gerbrand VAN DER ZOUW ,  Arie Jeffrey DEN BOEF ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Armand Eugene Albert KOOLEN ,  Hugo Augustinus Joseph CRAMER ,  Paul Christiaan HINNEN ,  Martinus Hubertus Maria VAN WEERT ,  Anagnostis TSIATMAS ,  Shu-jin WANG ,  Bastiaan Onne FAGGINGER AUER ,  Alok VERMA

IPC: G01N21/21 ,  G01N21/88 ,  G03F7/20

CPC classification number: G01N21/21 ,  G01N21/8806 ,  G01N2021/8848 ,  G03F7/70191 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633

Abstract: An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.

公开(公告)号：US20160025992A1

公开(公告)日：2016-01-28

申请号：US14805402

申请日：2015-07-21

Applicant: ASML Netherlands B.V.

Inventor： Gerbrand VAN DER ZOUW ,  Martin Jacobus Johan Jak ,  Martin Ebert

IPC: G02B27/28 ,  G01N21/47 ,  G01J1/08 ,  G02F1/01

CPC classification number: G02B27/283 ,  G01J1/08 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8848 ,  G01N2201/0675 ,  G02F1/01 ,  G03F7/70633

Abstract: In an illumination system (12, 13) for a scatterometer, first and second spatial light modulators lie in a common plane and are formed by different portions of a single liquid crystal cell (260). Pre-polarizers (250) apply polarization to first and second radiation prior to the spatial light modulators. A first spatial light modulator (236-S) varies a polarization state of the first radiation in accordance with a first programmable pattern. Second spatial light modulator (236-P) varies a polarization state of the second radiation accordance with a second programmable pattern. A polarizing beam splitter (234) selectively transmits each of the spatially modulated first and second radiation to a common output path, depending on the polarization state of the radiation. In an embodiment, functions of pre-polarizers are performed by the polarizing beam splitter.

Abstract translation: 在用于散射仪的照明系统（12,13）中，第一和第二空间光调制器位于公共平面中，并且由单个液晶单元（260）的不同部分形成。 预偏光器（250）在空间光调制器之前将偏振应用于第一和第二辐射。 第一空间光调制器（236-S）根据第一可编程模式改变第一辐射的偏振状态。 第二空间光调制器（236-P）根据第二可编程图案改变第二辐射的偏振状态。 偏振分束器（234）根据辐射的偏振状态选择性地将空间调制的第一和第二辐射中的每一个传输到公共输出路径。 在一个实施例中，预偏振器的功能由偏振分束器执行。

公开(公告)号：US20150108373A1

公开(公告)日：2015-04-23

申请号：US14548734

申请日：2014-11-20

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria PELLEMANS ,  Pavel Stanislavovich ANTSIFEROV ,  Vladimir Mihailovitch KRIVTSUN ,  Johannes Matheus Marie DE WIT ,  Ralph Jozef Johannes Gerardus Anna Maria SMEETS ,  Gerbrand VAN DER ZOUW

IPC: H05H1/24 ,  G01N21/956 ,  G03F7/20

CPC classification number: H05H1/24 ,  G01N21/956 ,  G01N2201/061 ,  G03F7/20 ,  G03F7/70033 ,  G03F7/70483 ,  G03F7/70616 ,  G03F7/70641 ,  H01J61/02 ,  H01J61/54 ,  H01J61/545 ,  H01J65/04 ,  H05B41/38 ,  H05G2/003 ,  H05G2/008

Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.

Abstract translation: 激光驱动光源包括激光和聚焦光学元件。 这些产生聚焦在容纳气体（例如Xe）的容器内的等离子体形成区域上的辐射束。 收集光学器件收集由激光辐射维持的等离子体发射的光子以形成输出辐射束。 等离子体具有细长形式（L> d），并且收集光学器件被配置为收集从等离子体沿纵向出现的光子。 与收集从等离子体横向辐射的辐射的源相比，等离子体的亮度增加。 使用光源的计量装置可以由于亮度的增加而获得更高的精度和/或吞吐量。 可以提供背反射器。 可以使用微波辐射代替激光辐射以形成等离子体。

公开(公告)号：US20220299365A1

公开(公告)日：2022-09-22

申请号：US17636308

申请日：2020-07-23

Applicant: ASML Netherlands B.V.

Inventor： Gerbrand VAN DER ZOUW ,  Marinus Johannes Maria VAN DAM ,  Jacob SONNEVELD ,  Ramon Pascal VAN GORKOM

IPC: G01J3/12 ,  G01J3/02 ,  G03F7/20

Abstract: Disclosed is a wavelength selection module for a metrology apparatus. The wavelength selection module comprises one or more filter elements being operable to receive an input radiation beam comprising multiple wavelengths to provide selective control of a wavelength characteristic of a corresponding output radiation beam. At least one of said one or more filter elements comprises at least two linear variable filters.

公开(公告)号：US20190129316A1

公开(公告)日：2019-05-02

申请号：US16170786

申请日：2018-10-25

Applicant: ASML Netherlands B.V.

Inventor： Zili ZHOU ,  Gerbrand VAN DER ZOUW ,  Nitesh PANDEY ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Martinus Hubertus Maria VAN WEERT ,  Anagnostis TSIATMAS ,  Sergey TARABRIN ,  Hilko Dirk BOS

IPC: G03F7/20

Abstract: The disclosure relates to methods of determining a value of a parameter of interest of a patterning process, and of cleaning a signal containing information about the parameter of interest. In one arrangement, first and second detected representations of radiation are obtained. The radiation is provided by redirection of polarized incident radiation by a structure. The first and second detected representations are derived respectively from first and second polarization components of the redirected radiation. An asymmetry in the first detected representation comprises a contribution from the parameter of interest and a contribution from one or more other sources of asymmetry. An asymmetry in the second detected representation comprises a larger contribution from said one or more other sources of asymmetry relative to a contribution from the parameter of interest. A combination of the first and second detected representations is used to determine a value of the parameter of interest.

公开(公告)号：US20170176714A1

公开(公告)日：2017-06-22

申请号：US15379918

申请日：2016-12-15

Applicant: ASML Netherlands B.V.

Inventor： Gerbrand VAN DER ZOUW

IPC: G02B7/28 ,  G01N21/47

CPC classification number: G02B7/285 ,  G01N21/4795 ,  G02B7/32 ,  G02B21/247

Abstract: A focus monitoring arrangement (1000) is provided for a scatterometer or other optical system. A first focus sensor (510) provides a first focus signal (S1-S2) indicating focus relative to a first reference distance (z1). A second focus sensor (1510) for providing a second focus signal (C1-C2) indicating focus relative to a second reference distance (z2). A processor (1530) calculates a third focus signal by combining the first focus signal and the second focus signal. By varying the proportions of the first and second focus signals in calculating the third focus signal, an effective focus offset can be varied electronically, without moving elements.

公开(公告)号：US20170097575A1

公开(公告)日：2017-04-06

申请号：US15279860

申请日：2016-09-29

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Zili ZHOU ,  Armand Eugene Albert KOOLEN ,  Gerbrand VAN DER ZOUW

IPC: G03F7/20 ,  G01B11/27 ,  G01N21/47

CPC classification number: G03F7/70625 ,  G01B11/272 ,  G01N21/47 ,  G03F7/7015 ,  G03F7/706 ,  G03F7/70633

Abstract: Disclosed is a metrology apparatus for measuring a parameter of a lithographic process, and associated computer program and method. The metrology apparatus comprises an optical system for measuring a target on a substrate by illuminating the target with measurement radiation and detecting the measurement radiation scattered by the target; and an array of lenses. Each lens of the array is operable to focus the scattered measurement radiation onto a sensor, said array of lenses thereby forming an image on the sensor which comprises a plurality of sub-images, each sub-image being formed by a corresponding lens of the array of lenses. The resulting plenoptic image comprises image plane information from the sub-images, wavefront distortion information (from the relative positions of the sub-images) and pupil information from the relative intensities of the sub-images.

公开(公告)号：US20130329204A1

公开(公告)日：2013-12-12

申请号：US13902285

申请日：2013-05-24

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria PELLEMANS ,  Pavel Stanislavovich ANTSIFEROV ,  Vladimir Mihailovitch KRIVTSUN ,  Johannes Matheus Marie DE WIT ,  Ralph Jozef Johannes Gerardus Anna Maria SMEETS ,  Gerbrand VAN DER ZOUW

IPC: H05H1/24 ,  G03F7/20

CPC classification number: H05H1/24 ,  G01N21/956 ,  G01N2201/061 ,  G03F7/20 ,  G03F7/70033 ,  G03F7/70483 ,  G03F7/70616 ,  G03F7/70641 ,  H01J61/02 ,  H01J61/54 ,  H01J61/545 ,  H01J65/04 ,  H05B41/38 ,  H05G2/003 ,  H05G2/008

Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.