公开(公告)号：US20180017879A1

公开(公告)日：2018-01-18

申请号：US15547713

申请日：2016-01-26

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Maurice Willem Jozef Etiënne WIJCKMANS ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Christiaan Alexander HOOGENDAM ,  Bernardus Antonius Johannes LUTTIKHUIS

IPC: G03F7/20

CPC classification number: G03F7/70833 ,  G03F7/70725 ,  G03F7/709

Abstract: A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.

公开(公告)号：US20240411233A1

公开(公告)日：2024-12-12

申请号：US18699358

申请日：2022-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Gosse Charles DE VRIES ,  Sjoerd Nicolaas Lambertus DONDERS ,  Franciscus Johannes Joseph JANSSEN ,  Evgenia KURGANOVA ,  Abraham Jan WOLF ,  Ties Jan Willem BAKKER ,  Volker Dirk HILDENBRAND ,  Paul Alexander VERMEULEN ,  Michael ENGEL ,  Bernardus Antonius Johannes LUTTIKHUIS ,  Ronald VAN DER HAM ,  Jeroen Peterus Johannes VAN LIPZIG

IPC: G03F7/00 ,  G03F1/62

Abstract: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support structure constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system; a substrate table constructed to support a substrate; a projection system configured to receive the radiation beam from the reticle-pellicle assembly and to project it onto the substrate; and a heating system configured to heat a pellicle of the reticle-pellicle assembly supported by the support structure. A method for using a reticle-pellicle assembly including: illuminating the reticle-pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle-pellicle assembly using a separate heat source.