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公开(公告)号：US20230350301A1
公开(公告)日：2023-11-02
申请号：US17800649
申请日：2021-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Evgenia KURGANOVA , Gosse Charles DE VRIES , Alexey Olegovich POLYAKOV , Jim Vincent OVERKAMP , Teis Johan COENEN , Tamara DRUZHININA , Sonia CASTELLANOS ORTEGA , Olivier Christian Maurice LUGIER
IPC: G03F7/16 , G03F7/36 , H01L21/027
CPC classification number: G03F7/167 , G03F7/36 , H01L21/027
Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a deposition-process material is provided in gaseous form. A layer of the deposition-process material is formed on the substrate by causing condensation or deposition of the gaseous deposition-process material. A selected portion of the layer of deposition-process material is irradiated to modify the deposition-process material in the selected portion.
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公开(公告)号：US20180314164A1
公开(公告)日：2018-11-01
申请号：US15523938
申请日：2015-11-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen DEKKERS , Han-Kwang NIENHUYS , Michael Jozef Mathijs RENKENS , Johannes Antonius Gerardus AKKERMANS , Gosse Charles DE VRIES , Erik Roelof LOOPSTRA
CPC classification number: G03F7/70158 , G02B5/1828 , G02B5/1838 , G02B5/1861 , G02B6/29314 , G02B26/004 , G03F7/70266 , G03F7/70308
Abstract: An adjustable diffraction grating includes: an optical element and a distortion mechanism. The optical element has an optical surface to receive an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism includes one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.
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公开(公告)号：US20190227445A1
公开(公告)日：2019-07-25
申请号：US16326948
申请日：2017-08-11
Applicant: ASML Netherlands B.V.
Inventor： Frits VAN DER MEULEN , Erik Johan ARLEMARK , Hendrikus Herman Marie COX , Martinus Agnes Willem CUIJPERS , Joost DE HOOGH , Gosse Charles DE VRIES , Paul Comé Henri DE WIT , Sander Catharina Reinier DERKS , Ronald Comelis Gerardus GIJZEN , Dries Vaast Paul HEMSCHOOTE , Christiaan Alexander HOOGENDAM , Adrianus Hendrik KOEVOETS , Raymond Wilhelmus Louis LAFARRE , Alain Louis Claude LEROUX , Patrick Willem Paul LIMPENS , Jim Vincent OVERKAMP , Christiaan Louis VALENTIN , Koos VAN BERKEL , Stan Henricus VAN DER MEULEN , Jacobus Comelis Gerardus VAN DER SANDEN , Harmen Klaas VAN DER SCHOOT , David Ferdinand VLES , Evert Auke Rinze WESTERHUIS
IPC: G03F7/20
Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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公开(公告)号：US20180031982A1
公开(公告)日：2018-02-01
申请号：US15549132
申请日：2016-02-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang NIENHUYS , Erik Willem BOGAART , Rilpho Ludovicus Donker , Borgert KRUIZINGA , Erik Roelof LOOPSTRA , Hako BOTMA , Gosse Charles DE VRIES , Olav Waldemar Vladimir FRIJNS , Johannes Jacobus Matheus BASELMANS
Abstract: A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.
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公开(公告)号：US20160225477A1
公开(公告)日：2016-08-04
申请号：US14917623
申请日：2014-09-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Vadim Yevgenyevich BANINE , Peturs Rutgerus BARTRAIJ , Ramon Pascal VAN GORKOM , Lucas Johannes Peter AMENT , Pieter Willem Herman DE JAGER , Gosse Charles DE VRIES , Rilpho Ludovicus DONKER , Wouter Joep ENGELEN , Olav Waldemar Vladimir FRIJNS , Leonardus Adrianus Gerardus GRIMMINCK , Andelko KATALENIC , Erik Roelof LOOPSTRA , Han-Kwang NIENHUYS , Andrey Alexandrovich NIKIPELOV , Michael Jozef Mathijs RENKENS , Franciscus Johannes Joseph JANSSEN , Borgert KRUIZINGA
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
Abstract translation: 用于光刻系统的传送系统。 光束传送系统包括被配置为从辐射源接收辐射束并且沿着一个或多个方向反射辐射部分的光学元件，以形成用于提供给一个或多个工具的一个或多个分支辐射束。
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Patent Agency Ranking
公开(公告)号：US20160147161A1
公开(公告)日：2016-05-26
申请号：US14900110
申请日：2014-06-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Olav Waldemar Vladimir FRIJNS , Gosse Charles DE VRIES , Erik Roelof LOOPSTRA , Vadim Yevgenyevich BANINE , Pieter Willem Herman DE JAGER , Rilpho Ludovicus DONKER , Han-Kwang NIENHUYS , Borgert KRUIZINGA , Wouter Joep ENGELEN , Otger Jan LUITEN , Johannes Antonius Gerardus AKKERMANS , Leonardus Adrianus Gerardus GRIMMINCK , Vladimir LITVINENKO
IPC: G03F7/20
CPC classification number: G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.
Abstract translation: 图案化平版印刷基板的方法，其包括使用自由电子激光器产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备。 该方法还包括通过使用基于反馈的控制回路来相对地调节自由电子激光器的调节和调整自由电子激光器的操作来减少递送到光刻基片的EUV辐射的功率波动，以及将可变衰减应用于具有 由自由电子激光器输出，以便进一步控制传送到光刻设备的EUV辐射的功率。
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公开(公告)号：US20210132514A1
公开(公告)日：2021-05-06
申请号：US16604976
申请日：2018-01-31
Applicant: ASML Netherlands B.V.
Inventor： Gosse Charles DE VRIES , Nicolaas TEN KATE
IPC: G03F7/20
Abstract: A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, comprising at least one housing comprising at least one internal wall, at least one optical component arranged within at least one chamber defined at least in part by the at least one internal wall and configured to receive a radiation beam and a cooling apparatus arranged to cool at least a portion of the at least one internal wall to a temperature below that of the at least one optical component.
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公开(公告)号：US20180252930A1
公开(公告)日：2018-09-06
申请号：US15754480
申请日：2016-08-03
Applicant: ASML Netherlands B.V.
Inventor： Gosse Charles DE VRIES , Han-Kwang NIENHUYS
CPC classification number: G02B27/1093 , G02B5/1838 , G02B5/1857 , G02B5/1861 , G02B6/29313 , G02B27/1086 , G03F7/70025 , G03F7/70033 , G03F7/70158 , G03F7/70208 , G03F7/70316 , G03F7/7055 , G03F7/70566 , G03F7/70991 , H01S3/0903
Abstract: A beam-splitting apparatus arranged to receive an input radiation beam and split the input radiation beam into a plurality of output radiation beams. The beam-splitting apparatus comprising a plurality of reflective diffraction gratings arranged to receive a radiation beam and configured to form a diffraction pattern comprising a plurality of diffraction orders, at least some of the reflective diffraction gratings being arranged to receive a 0th diffraction order formed at another of the reflective diffraction gratings. The reflective diffraction gratings are arranged such that the optical path of each output radiation beam includes no more than one instance of a diffraction order which is not a 0th diffraction order.
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公开(公告)号：US20180239259A1
公开(公告)日：2018-08-23
申请号：US15753226
申请日：2016-08-03
Applicant: ASML Netherlands B.V.
Inventor： Han-Kwang NIENHUYS , Gosse Charles DE VRIES
CPC classification number: G03F7/70191 , G02B26/023 , G03F7/70025 , G03F7/70033 , G03F7/70158 , G03F7/70525 , G03F7/7055
Abstract: An apparatus (60) for adjusting an intensity of radiation. The apparatus comprises a grating (61) for receiving a radiation beam (Ba) and for directing at least a portion of the radiation beam in a first direction in the form of a first reflected radiation beam (Ba0), and one or more first actuators operable to rotate the grating to adjust a grazing angle between the radiation beam and a surface of the grating so as to vary an intensity of the reflected radiation beam.
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公开(公告)号：US20180239252A1
公开(公告)日：2018-08-23
申请号：US15525626
申请日：2015-11-04
Applicant: ASML Netherlands B.V.
Inventor： Han-Kwang NIENHUYS , Sjoerd Nicolaas Lambertus DONDERS , Gosse Charles DE VRIES , Michael Josef Mathijs RENKENS , Erik Roelof LOOPSTRA
IPC: G03F7/20
CPC classification number: G03F7/70891 , G02B5/1838 , G02B5/1861 , G02B7/1815 , G03F7/2008 , G03F7/70266 , G03F7/7095
Abstract: A reflector (2) comprising a plate (4) supported by a substrate (8), wherein the plate has a reflective surface (5) and is secured to the substrate by adhesive free bonding, and wherein a cooling channel array (10) is provided in the reflector. The channels (16) of the cooling channel array may be formed from open channels in a surface of the substrate, the open channels being closed by the plate to create the channels.
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