公开(公告)号：US20170017150A1

公开(公告)日：2017-01-19

申请号：US15281056

申请日：2016-09-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich BANINE ,  Erik Roelof LOOPSTRA ,  Harmen Klaas VAN DER SCHOOT ,  Lucas Henricus Johannes STEVENS ,  Maarten VAN KAMPEN

IPC: G03F1/64 ,  G03F7/20

CPC classification number: G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

Abstract translation: 包括石墨烯的防护薄膜组件被构造并布置成用于EUV掩模版。 多层反射镜包括石墨烯作为最外层。

公开(公告)号：US20180259846A1

公开(公告)日：2018-09-13

申请号：US15974661

申请日：2018-05-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich BANINE ,  Erik Roelof LOOPSTRA ,  Harmen Klaas VAN DER SCHOOT ,  Lucas Henricus Johannes STEVENS ,  Maarten VAN KAMPEN

IPC: G03F1/64 ,  G03B27/54 ,  G02B5/20 ,  G02B27/00 ,  C01B32/20 ,  G03F7/20 ,  H01B1/24 ,  H01B1/04 ,  G21K1/06 ,  G03F1/24 ,  G02B5/08 ,  B82Y40/00 ,  B82Y10/00 ,  G03F1/62

CPC classification number: G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

公开(公告)号：US20190227445A1

公开(公告)日：2019-07-25

申请号：US16326948

申请日：2017-08-11

Applicant: ASML Netherlands B.V.

Inventor： Frits VAN DER MEULEN ,  Erik Johan ARLEMARK ,  Hendrikus Herman Marie COX ,  Martinus Agnes Willem CUIJPERS ,  Joost DE HOOGH ,  Gosse Charles DE VRIES ,  Paul Comé Henri DE WIT ,  Sander Catharina Reinier DERKS ,  Ronald Comelis Gerardus GIJZEN ,  Dries Vaast Paul HEMSCHOOTE ,  Christiaan Alexander HOOGENDAM ,  Adrianus Hendrik KOEVOETS ,  Raymond Wilhelmus Louis LAFARRE ,  Alain Louis Claude LEROUX ,  Patrick Willem Paul LIMPENS ,  Jim Vincent OVERKAMP ,  Christiaan Louis VALENTIN ,  Koos VAN BERKEL ,  Stan Henricus VAN DER MEULEN ,  Jacobus Comelis Gerardus VAN DER SANDEN ,  Harmen Klaas VAN DER SCHOOT ,  David Ferdinand VLES ,  Evert Auke Rinze WESTERHUIS

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US20160370716A1

公开(公告)日：2016-12-22

申请号：US15121719

申请日：2015-03-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Joost KAUFFMAN ,  Martin Dieter Nico PETERS ,  Petrus Theodorus RUTGERS ,  Martijn Hendrikus Wilhelmus STOPEL ,  Gerard VAN DEN EIJKEL ,  Harmen Klaas VAN DER SCHOOT ,  Raimond VISSER

IPC: G03F7/20 ,  H01L21/66 ,  H01L21/687 ,  G01B11/27 ,  H01L21/68

CPC classification number: G03F7/70775 ,  G01B11/272 ,  G03F7/7075 ,  G03F9/7011 ,  H01L21/681 ,  H01L21/682 ,  H01L21/68707 ,  H01L22/12

Abstract: A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.

Abstract translation: 一种被配置为确定具有边缘的基底的位置的传感器系统。 传感器系统包括布置成发射辐射束的辐射源，反射元件，检测器装置和具有用于支撑衬底的支撑表面的衬底台。 支撑表面至少部分地沿着平面。 辐射源和检测器装置布置在平面的第一侧上。 反射元件布置在除了第一侧之外的平面的第二侧上。 反射元件布置成通过反射辐射束来产生反射束。 反射元件布置成用反射束照射边缘。 检测器装置被布置成接收反射束。