公开(公告)号：US20180259846A1

公开(公告)日：2018-09-13

申请号：US15974661

申请日：2018-05-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich BANINE ,  Erik Roelof LOOPSTRA ,  Harmen Klaas VAN DER SCHOOT ,  Lucas Henricus Johannes STEVENS ,  Maarten VAN KAMPEN

IPC: G03F1/64 ,  G03B27/54 ,  G02B5/20 ,  G02B27/00 ,  C01B32/20 ,  G03F7/20 ,  H01B1/24 ,  H01B1/04 ,  G21K1/06 ,  G03F1/24 ,  G02B5/08 ,  B82Y40/00 ,  B82Y10/00 ,  G03F1/62

CPC classification number: G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

公开(公告)号：US20220390850A1

公开(公告)日：2022-12-08

申请号：US17775361

申请日：2020-10-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Ruud Antonius Catharina Maria BEERENS ,  Koen Gerhardus WINKELS ,  Dirk Willem HARBERTS ,  Lucas Henricus Johannes STEVENS ,  Dennis Dominic VAN DER VOORT ,  Edwin Johannes Cornelis BOS ,  George Alois Leonie LEENKNEGT ,  Nicolaas TEN KATE

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/67

Abstract: A substrate support is configured to support a substrate. The substrate support comprises a plurality of burls protruding from a base surface of the substrate support. The burls have distal ends in a plane for supporting a lower surface of the substrate with a gap between the base surface of the substrate support and the lower surface of the substrate. The substrate support comprises a liquid supply channel for supplying a conductive liquid to the gap so as to bridge the gap between the base surface of the substrate support and the lower surface of the substrate, thereby allowing charge to pass between the substrate support and the substrate. The substrate support has a controlled electrical potential such that charge distribution at the lower surface of the substrate can be manipulated.

公开(公告)号：US20200183289A1

公开(公告)日：2020-06-11

申请号：US16690198

申请日：2019-11-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas POIESZ ,  Bert Dirk SCHOLTEN ,  Dirk Willem HARBERTS ,  Lucas Henricus Johannes STEVENS ,  Laura Maria FERNANDEZ DIAZ ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Abraham Alexander SOETHOUDT ,  Wilhelmus Jacobus Johannes WELTERS ,  Jimmy Matheus Wilhelmus VAN DE WINKEL

IPC: G03F7/20

Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US20200150549A1

公开(公告)日：2020-05-14

申请号：US16623898

申请日：2018-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Lucas Henricus Johannes STEVENS ,  Nina Vladimirovna DZIOMKINA ,  Laura Maria FERNANDEZ DIAZ ,  Johannes Adrianus Cornelis Maria PIJNENBURG

IPC: G03F7/20 ,  H01L21/687

Abstract: A system including: a substrate support configured to hold a substrate; a conductive or semi-conductive element contacting the substrate support and covering at least part of the substrate support; and a charging device configured to apply a positive potential to the conductive or semi-conductive element with respect to the part of the substrate support that is covered by the conductive or semi-conductive element.

公开(公告)号：US20170017150A1

公开(公告)日：2017-01-19

申请号：US15281056

申请日：2016-09-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich BANINE ,  Erik Roelof LOOPSTRA ,  Harmen Klaas VAN DER SCHOOT ,  Lucas Henricus Johannes STEVENS ,  Maarten VAN KAMPEN

IPC: G03F1/64 ,  G03F7/20

CPC classification number: G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

Abstract translation: 包括石墨烯的防护薄膜组件被构造并布置成用于EUV掩模版。 多层反射镜包括石墨烯作为最外层。