公开(公告)号：US10031428B2

公开(公告)日：2018-07-24

申请号：US14762450

申请日：2014-02-20

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Koen Cuypers ,  Marcelo Henrique De Andrade Oliveira ,  Marinus Jan Remie ,  Chattarbir Singh ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Anita Jozef Wilhemus Van De Ven ,  José Nilton Fonseca Junior ,  Frank Johannes Jacobus Van Boxtel ,  Daniel Nathan Burbank ,  Erik Roelof Loopstra ,  Johannes Onvlee ,  Mark Josef Schuster ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Christopher Charles Ward ,  Jan Steven Christiaan Westerlaken

IPC: G03B27/52 ,  G03F7/20

Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.

公开(公告)号：US09213246B2

公开(公告)日：2015-12-15

申请号：US14179276

申请日：2014-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf Kemper ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

IPC: G03F7/20 ,  F01N1/02

CPC classification number: G03F7/70341 ,  F01N1/023 ,  G03F7/709

Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

Abstract translation: 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。

公开(公告)号：US10139735B2

公开(公告)日：2018-11-27

申请号：US15316036

申请日：2015-05-13

Applicant: ASML Netherlands B.V.

Inventor： Johannes Jacobus Matheus Baselmans ,  Hans Butler ,  Christiaan Alexander Hoogendam ,  Sander Kerssemakers ,  Bart Smeets ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Hubertus Petrus Leonardus Henrica Van Bussel

IPC: G02B27/52 ,  G03F7/20

Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.

公开(公告)号：US20140300879A1

公开(公告)日：2014-10-09

申请号：US14179276

申请日：2014-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  F01N1/023 ,  G03F7/709

Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

Abstract translation: 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。