公开(公告)号：US20150323872A1

公开(公告)日：2015-11-12

申请号：US14762190

申请日：2013-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Anton Bernhard VAN OOSTEN ,  Hans BUTLER ,  Erik Roelof LOOPSTRA ,  Marc Wilhelmus Maria VAN DER WIJST ,  Koen Jacobus Johannes Maria ZAAL

IPC: G03F7/20 ,  G02B7/182

CPC classification number: G03F7/702 ,  G02B7/182 ,  G02B7/1827 ,  G02B26/0825 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/70266 ,  G03F7/70575 ,  G03F7/709

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

Abstract translation: 公开了一种被配置为将光束投射到光刻设备内的基板的目标部分上的系统。 该系统包括具有用于定位反射镜和/或配置反射镜形状的致动器（500）的反射镜（510），致动器还为反射镜提供主动阻尼，以及用于产生致动器控制的控制器（515a，515b） 用于控制所述致动器的信号。 当定位所述反射镜和/或构造所述反射镜的形状时，第一坐标系用于控制所述致动器，并且当向所述反射镜提供主动阻尼时，使用第二坐标系来控制所述致动器。

公开(公告)号：US20180101099A1

公开(公告)日：2018-04-12

申请号：US15567103

申请日：2016-03-08

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Marc Wilhelmus Maria VAN DER WIJST ,  Martinus VAN DUIJNHOVEN ,  Cornelius Adrianus Lambertus DE HOON ,  Frank Johannes Jacobus VAN BOXTEL

IPC: G03F7/20

CPC classification number: G03F7/20 ,  G03F7/709

Abstract: A lithographic apparatus has shield which protects a functional subsystem form acoustic disturbances. The shield comprises a locally resonant sonic material for implementing the protecting. In an embodiment the shield comprises a panel formed by a cell or a plurality of cells comprising: a frame; an elastic membrane whose edge is fixed to the frame; and a mass attached to a location at the membrane at a non-zero distance from the edge.

公开(公告)号：US20160004170A1

公开(公告)日：2016-01-07

申请号：US14852952

申请日：2015-09-14

Applicant: ASML Netherlands B.V. ,  Carl Zeiss SMT GmbH

Inventor： Marc Wilhelmus Maria VAN DER WIJST ,  Hans Butler ,  Erik Roelof Loopstra ,  Bernhard Geuppert ,  Marco Hendrikus Hermanus Oude Nijhuis ,  Rodolfo Guglielmi Rabe ,  Yim Bun Patrick Kwan ,  Dick Antonius Hendrikus Laro

IPC: G03F7/20 ,  F16F15/02 ,  F16F15/08

CPC classification number: G03F7/70141 ,  F16F15/022 ,  F16F15/08 ,  G03F7/708 ,  G03F7/709

Abstract: Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).

Abstract translation: 公开了平版印刷设备和设备制造方法，其中提供了用于减少振动在投影系统的第一元件和投影系统的第二元件之间传播的程度的装置。 所公开的方法包括使用多个弹性构件串联作为隔振系统的一部分，用于分开支撑第一和第二投影系统框架的多个隔离框架以及用于第一和第二投影系统框架之间的相互作用的修改的连接位置以及隔离 框架。

公开(公告)号：US20170090296A1

公开(公告)日：2017-03-30

申请号：US15311544

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Mark Constant Johannes BAGGEN ,  Gerard Johannes BOOGAARD ,  Nicolaas Rudolf KEMPER ,  Sander KERSSEMAKERS ,  Robertus Mathijs Gerardus RIJS ,  Frank Johannes Jacobus VAN BOXTEL ,  Erwin Antonius Henricus Franciscus VAN DEN BOOGAERT ,  Marc Wilhelmus Maria VAN DER WIJST ,  Martinus VAN DUIJNHOVEN ,  Jessica Henrica Anna VERDONSCHOT ,  Hendrikus Herman Marie COX

IPC: G03F7/20 ,  G10K11/168

CPC classification number: G03F7/709 ,  G10K11/16 ,  G10K11/168 ,  G10K11/172

Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of Cthrough-holes (102), between the chamber and the compartment.

公开(公告)号：US20230279919A1

公开(公告)日：2023-09-07

申请号：US18178088

申请日：2023-03-03

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Alexander Petrus Josephus VAN LANKVELT ,  Michiel VERVOORDELDONK ,  Pavel KAGAN ,  Marc Wilhelmus Maria VAN DER WIJST ,  Galip Tuna TURKBEY ,  Marco HUISKAMP ,  Ulrich SCHOENHOFF

IPC: F16F9/04 ,  F16F15/027

CPC classification number: F16F9/049 ,  F16F15/027 ,  F16F2224/046 ,  F16F2222/126 ,  F16F2230/42

Abstract: A vibration isolator (10; 210) for supporting a payload and isolating the payload from vibrations has a contact member (12) configured for supporting the payload, at least two pressurized gas compartments (24) arranged offset from each other to support the contact member at different locations, which pressurized gas compartments are connected to each other via a tubing system (54). The tubing system contains at least one restriction (66) at which a cross section of the tubing system is reduced by at least 50%.

公开(公告)号：US20180203362A1

公开(公告)日：2018-07-19

申请号：US15743273

申请日：2016-06-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Wilhelmus Patrick Elisabeth Maria OP 'T ROOT ,  Herman Philip GODFRIED ,  Hubertus Petrus Leonardus Henrica VAN BUSSEL ,  Arij Jonathan RIJKE ,  Marc Wilhelmus Maria VAN DER WIJST ,  Mathijs Leonardus Johan VERHEES

IPC: G03F7/20

CPC classification number: G03F7/70041 ,  G03F7/70133 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/709

Abstract: A technique involving projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.

公开(公告)号：US20160238953A1

公开(公告)日：2016-08-18

申请号：US15027986

申请日：2014-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  Marc Wilhelmus Maria VAN DER WIJST ,  Thijs VERHEES ,  Sander KERSSEMAKERS

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70766 ,  G03F7/70833 ,  G03F7/709

Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.

Abstract translation: 光刻设备包括基架，照明系统，其配置为调节辐射束并由基架支撑，支撑结构以支撑图案形成装置，所述图案形成装置能够将辐射束赋予其横截面图案， 形成图案化的辐射束，构造成保持衬底的衬底台，配置成将图案化的辐射束投影到衬底的目标部分上的投影系统，配置成定位衬底台的定位装置，定位装置被支撑 通过基架，传感器被配置为感测由施加在基架上的扭矩引起的振动;以及致动器，其被配置为响应于感测到的振动而对照明系统或基架施加力，以致于 至少部分抑制振动。

公开(公告)号：US20200285155A1

公开(公告)日：2020-09-10

申请号：US16881109

申请日：2020-05-22

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Anton Bernhard VAN OOSTEN ,  Hans BUTLER ,  Erik Roelof LOOPSTRA ,  Marc Wilhelmus Maria VAN DER WIJST ,  Koen Jacobus Johannes Maria ZAAL

IPC: G03F7/20 ,  G02B7/182 ,  G02B26/08

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.

公开(公告)号：US20190129317A1

公开(公告)日：2019-05-02

申请号：US16219449

申请日：2018-12-13

Applicant: ASML Netherlands B.V.

Inventor： Michael RONDE ,  Lucas KUINDERSMA ,  Niels BOSCH ,  Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  Marc Wilhelmus Maria VAN DER WIJST ,  Thijs VERHEES ,  Sander KERSSEMAKERS

IPC: G03F7/20

Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.

公开(公告)号：US20180059555A1

公开(公告)日：2018-03-01

申请号：US15558552

申请日：2016-02-22

Applicant: ASML Netherlands B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Marcel Koenraad Marie BAGGEN ,  Fransiscus Mathijs JACOBS ,  Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Frank Pieter Albert VAN DEN BERKMORTEL ,  Marc Wilhelmus Maria VAN DER WIJST

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70775 ,  G03F7/70633 ,  G03F7/70641 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/709 ,  G03F9/70 ,  G03F9/7046

Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.