公开(公告)号：US12271114B2

公开(公告)日：2025-04-08

申请号：US17441729

申请日：2020-03-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Scott Anderson Middlebrooks ,  Adrianus Cornelis Matheus Koopman ,  Markus Gerardus Martinus Maria Van Kraaij ,  Maxim Pisarenco ,  Stefan Hunsche

IPC: G03F7/00 ,  G06N3/08 ,  G06T7/00

Abstract: A method for training a machine learning model configured to predict a substrate image corresponding to a printed pattern of a substrate as measured via a metrology tool. The method involves obtaining a training data set including (i) metrology data of the metrology tool used to measure the printed pattern of the substrate, and (ii) a representation of a mask pattern employed for imaging the printed pattern on the substrate; and training, based on the training data set, a machine learning model to predict the substrate image of the substrate as measured by the metrology tool such that a cost function is improved, wherein the cost function includes a relationship between the predicted substrate image and the metrology data.

公开(公告)号：US11692948B2

公开(公告)日：2023-07-04

申请号：US16963905

申请日：2019-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitish Kumar ,  Richard Quintanilha ,  Markus Gerardus Martinus Maria Van Kraaij ,  Konstantin Tsigutkin ,  Willem Marie Julia Marcel Coene

IPC: G01N21/956 ,  G02F1/35 ,  G03F1/84

CPC classification number: G01N21/956 ,  G02F1/353 ,  G03F1/84 ,  G01N2021/95676 ,  G01N2201/06113

Abstract: A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.

公开(公告)号：US11429763B2

公开(公告)日：2022-08-30

申请号：US16806266

申请日：2020-03-02

Applicant: ASML Netherlands B.V.

Inventor： Remco Dirks ,  Markus Gerardus Martinus Maria Van Kraaij ,  Maxim Pisarenco

IPC: G06F30/20 ,  H01L21/66 ,  H01L21/3065 ,  H01L21/308 ,  G03F7/20

Abstract: Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904′, 906′) along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.

公开(公告)号：US11347151B2

公开(公告)日：2022-05-31

申请号：US16394738

申请日：2019-04-25

Applicant: ASML Netherlands B.V.

Inventor： Markus Gerardus Martinus Maria Van Kraaij ,  Maxim Pisarenco ,  Richard Quintanilha

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G03F9/00

Abstract: A method of calculating electromagnetic scattering properties of a structure represented as a nominal structure and a structural perturbation, has the steps: 1008 numerically solving a volume integral equation comprising a nominal linear system 1004 to determine a nominal vector field being independent with respect to the structural perturbation; 1010 using a perturbed linear system 1006 to determine an approximation of a vector field perturbation arising from the structural perturbation, by solving a volume integral equation or an adjoint linear system. Matrix-vector multiplication of a nominal linear system matrix convolution operator may be restricted to sub-matrices; and 1012 calculating electromagnetic scattering properties of the structure using the determined nominal vector field and the determined approximation of the vector field perturbation.

公开(公告)号：US10437157B2

公开(公告)日：2019-10-08

申请号：US15533309

申请日：2015-11-13

Applicant: ASML Netherlands B.V.

Inventor： Scott Anderson Middlebrooks ,  Markus Gerardus Martinus Maria Van Kraaij ,  Adrianus Cornelis Matheus Koopman ,  Stefan Hunsche ,  Willem Marie Julia Marcel Coene

IPC: G03B27/32 ,  G03F7/20 ,  G06T7/12 ,  G06T7/149 ,  G06T7/60

Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.

公开(公告)号：US20170017738A1

公开(公告)日：2017-01-19

申请号：US15209290

申请日：2016-07-13

Applicant: ASML Netherlands B.V.

Inventor： Remco DIRKS ,  Markus Gerardus Martinus Maria Van Kraaij ,  Maxim Pisarenco

IPC: G06F17/50 ,  G03F7/20 ,  H01L21/308 ,  H01L21/66 ,  H01L21/3065

Abstract: Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904′, 906′) along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.

Abstract translation: 通过从观测的衍射辐射重建来测量结构（900）的参数。 该方法包括以下步骤：（a）定义结构模型以表示二维或三维模型空间中的结构; （b）使用结构模型来模拟辐射与结构的相互作用; 和（c）重复步骤（b），同时改变结构模型的参数。 结构模型沿模型空间的至少第一维度（Z）分为一系列切片（a-f）。 通过划分成切片，至少一个子结构的倾斜面（904,906）通过沿着模型空间（X）的至少第二维度的一系列步骤（904'，906'）近似。 切片的数量可能随参数变化而动态变化。 接近所述倾斜面的步骤数保持恒定。 引入附加切割（1302,1304），而不引入相应的步骤。

公开(公告)号：US08760662B2

公开(公告)日：2014-06-24

申请号：US14011663

申请日：2013-08-27

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey Den Boef ,  Arno Jan Bleeker ,  Youri Johannes Laurentius Maria Van Dommelen ,  Mircea Dusa ,  Antoine Gaston Marie Kiers ,  Paul Frank Luehrmann ,  Henricus Petrus Maria Pellemans ,  Maurits Van Der Schaar ,  Cédric Désiré Grouwstra ,  Markus Gerardus Martinus Maria Van Kraaij

IPC: G01J3/45

CPC classification number: G01N21/8806 ,  G03F7/70341 ,  G03F7/70633 ,  G03F7/7065 ,  G03F9/7034

Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

Abstract translation: 通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。 该属性可以是角度和波长相关的，并且可以包括TM和TE偏振辐射的强度及其相对相位差。

公开(公告)号：US11720029B2

公开(公告)日：2023-08-08

申请号：US17497207

申请日：2021-10-08

Applicant: ASML Netherlands B.V.

Inventor： Scott Anderson Middlebrooks ,  Markus Gerardus Martinus Maria Van Kraaij ,  Adrianus Cornelis Matheus Koopman ,  Stefan Hunsche ,  Willem Marie Julia Marcel Coene

IPC: G03F7/20 ,  G03F7/00 ,  G06T7/12 ,  G06T7/149 ,  G06T7/60

CPC classification number: G03F7/705 ,  G03F7/7065 ,  G03F7/70625 ,  G03F7/70633 ,  G06T7/12 ,  G06T7/149 ,  G06T7/60 ,  G06T2207/10061 ,  G06T2207/20161 ,  G06T2207/30148

Abstract: A method and apparatus of detection, registration and quantification of an image is described. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.

公开(公告)号：US11143970B2

公开(公告)日：2021-10-12

申请号：US16943296

申请日：2020-07-30

Applicant: ASML Netherlands B.V.

Inventor： Scott Anderson Middlebrooks ,  Markus Gerardus Martinus Maria Van Kraaij ,  Adrianus Cornelis Matheus Koopman ,  Stefan Hunsche ,  Willem Marie Julia Marcel Coene

IPC: G03B27/32 ,  G03F7/20 ,  G06T7/12 ,  G06T7/149 ,  G06T7/60

Abstract: A method and apparatus of detection, registration and quantification of an image is described. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.

公开(公告)号：US11041816B2

公开(公告)日：2021-06-22

申请号：US15839299

申请日：2017-12-12

Applicant: ASML Netherlands B.V.

Inventor： Maxim Pisarenco ,  Frank Stefan Schneider ,  Markus Gerardus Martinus Maria Van Kraaij ,  Martijn Constant Van Beurden

IPC: G01N21/956 ,  G03F7/20 ,  G01N21/95

Abstract: Disclosed is a method for reconstructing a parameter of a lithographic process. The method comprises the step of designing a preconditioner suitable for an input system comprising the difference of a first matrix and a second matrix, the first matrix being arranged to have a multi-level structure of at least three levels whereby at least two of said levels comprise a Toeplitz structure. One such preconditioner is a block-diagonal matrix comprising a BTTB structure generated from a matrix-valued inverse generating function. A second such preconditioner is determined from an approximate decomposition of said first matrix into one or more Kronecker products.