公开(公告)号：US20200303158A1

公开(公告)日：2020-09-24

申请号：US16870747

申请日：2020-05-08

Applicant: ASML Netherlands B.V.

Inventor： Niels Johannes Maria Bosch ,  Peter Paul Hempenius ,  Sven Antoin Johan HOL ,  Marcel Koenrood Marie Baggen

IPC: H01J37/20 ,  H01J37/09 ,  H01J37/304

Abstract: The invention relates to a particle beam apparatus comprising: a particle beam source configured to generate a particle beam; a magnetic coil configured to emit a magnetic field to manipulate the particle beam; an object table configured to hold a substrate; a positioning device comprising ferromagnetic material, the positioning device further comprising at least one motor configured to position the object table with respect to the particle beam; and a controller configured to provide a control signal to the at least one motor to at least partly compensate for a magnetic force induced by the magnetic field acting on the positioning device.

公开(公告)号：US20200373118A1

公开(公告)日：2020-11-26

申请号：US16992058

申请日：2020-08-12

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie BAGGEN ,  Peter Paul HEMPENIUS ,  Maarten Frans Janus KREMERS ,  Robertus Jacobus Theodorus VAN KEMPEN ,  Sven Antoin Johan HOL ,  Henricus Martinus Johannes VAN DE GROES ,  Johannes Hubertus Antonius VAN DE RIJDT ,  Niels Johannes Maria BOSCH ,  Maarten Hartger KIMMAN

IPC: H01J37/20 ,  H01L21/66 ,  H01J37/28

Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.

公开(公告)号：US20160313649A1

公开(公告)日：2016-10-27

申请号：US15105343

申请日：2014-12-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Sven Antoin Johan HOL ,  Andrea Lodovico MANCUSO ,  Hendricus Johnnes, Maria MEIJER ,  Erik Maria REKKERS ,  Marinus Johannes Maria VAN DAM

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70758 ,  G03F7/70825 ,  G03F7/70941

Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets (370). A moving part includes a permanent magnet (362) with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. A ferromagnetic shield (820) is provided around the moving part and has at least one interruption (822) to reduce the influence of adjacent actuators or stray fields whilst also minimizing attraction between the permanent magnet (362) and the shield (820).

Abstract translation: 移动例如反射镜的致动器通过改变两个电磁体（370）中的电流来提供具有至少两个自由度的运动。 移动部件包括永磁体（362），其具有被限制在基本垂直于磁体的磁化方向的第一平面中的工作区域上移动的磁性面。 电磁体具有基本上位于与第一平面紧密平行的第二平面中的极面，每个极面基本上填充由移动磁体的表面穿过的区域的象限。 铁磁屏蔽（820）设置在运动部分的周围，并且具有至少一个中断（822），以减小相邻致动器或杂散磁场的影响，同时还使永磁体（362）和屏蔽（820）之间的吸引力最小化。