公开(公告)号：US10261422B2

公开(公告)日：2019-04-16

申请号：US15500866

申请日：2015-06-30

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus Van Den Nieuwelaar ,  Victor Manuel Blanco Carballo ,  Casper Roderik De Groot ,  Rolf Hendrikus Jacobus Custers ,  David Merritt Phillips ,  Frederik Antonius Van Der Zanden ,  Pieter Lein Joseph Gunter ,  Erik Henricus Egidius Catharina Eummelen ,  Yuri Johannes Gabriël Van De Vijver ,  Bert Dirk Scholten ,  Marijn Wouters ,  Ronald Frank Kox ,  Jorge Alberto Vieyra Salas

IPC: G03F7/20 ,  G02B27/00

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

公开(公告)号：US10534270B2

公开(公告)日：2020-01-14

申请号：US16269745

申请日：2019-02-07

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus Van den Nieuwelaar ,  Victor Manuel Blanco Carballo ,  Casper Roderik De Groot ,  Rolf Hendrikus Jacobus Custers ,  David Merritt Phillips ,  Frederik Antonius Van der Zanden ,  Pieter Lein Joseph Gunter ,  Erik Henricus Egidius Catharina Eummelen ,  Yuri Johannes Gabriël Van de Vijver ,  Bert Dirk Scholten ,  Marijn Wouters ,  Ronald Frank Kox ,  Jorge Alberto Vieyra Salas

IPC: G06F7/20 ,  G03F7/20 ,  G02B27/00

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

公开(公告)号：US10551748B2

公开(公告)日：2020-02-04

申请号：US15537214

申请日：2015-12-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria Rops ,  Walter Theodorus Matheus Stals ,  David Bessems ,  Giovanni Luca Gattobigio ,  Victor Manuel Blanco Carballo ,  Erik Henricus Egidius Catharina Eummelen ,  Ronald Van Der Ham ,  Frederik Antonius Van Der Zanden ,  Wilhelmus Antonius Wernaart

IPC: G03F7/20 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US10509331B2

公开(公告)日：2019-12-17

申请号：US16332820

申请日：2017-08-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jorge Alberto Vieyra Salas ,  Auke Juriaan Been ,  Victor Manuel Blanco Carballo

IPC: G03F7/20

Abstract: An immersion lithography apparatus having a controller configured to control a positioner to move a support table relative to an immersion space between the support table and a projection system to follow a route having a series of motions, the controller adapted to: predict a speed of an edge of the immersion space relative to an edge of an object on the support table when the edge of the immersion space passes over the edge of the object during at least one motion of the series of motions of the route; compare the speed to a predetermined parameter and to predict liquid loss from the immersion space during the at least one motion if the speed is greater than the predetermined parameter; and if liquid loss from the immersion space is predicted, modify one or more parameters of the route during the at least one motion accordingly.

公开(公告)号：US10859919B2

公开(公告)日：2020-12-08

申请号：US16778635

申请日：2020-01-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria Rops ,  Walter Theodorus Matheus Stals ,  David Bessems ,  Giovanni Luca Gattobigio ,  Victor Manuel Blanco Carballo ,  Erik Henricus Egidius Catharina Eummelen ,  Ronald Van Der Ham ,  Frederik Antonius Van Der Zanden ,  Wilhelmus Antonius Wernaart

IPC: G03F7/20 ,  B01D19/00 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US10782618B2

公开(公告)日：2020-09-22

申请号：US16677750

申请日：2019-11-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Jorge Alberto Vieyra Salas ,  Auke Juriaan Been ,  Victor Manuel Blanco Carballo

IPC: G03F7/20

Abstract: An immersion lithography apparatus having a controller configured to control a positioner to move a support table relative to an immersion space between the support table and a projection system to follow a route having a series of motions, the controller adapted to: predict a speed of an edge of the immersion space relative to an edge of an object on the support table when the edge of the immersion space passes over the edge of the object during at least one motion of the series of motions of the route; compare the speed to a predetermined parameter and to predict liquid loss from the immersion space during the at least one motion if the speed is greater than the predetermined parameter; and if liquid loss from the immersion space is predicted, modify one or more parameters of the route during the at least one motion accordingly.