公开(公告)号：US20250012855A1

公开(公告)日：2025-01-09

申请号：US18712464

申请日：2022-10-28

Applicant: ASML Netherlands B.V.

Inventor： Dongchi YU ,  Erheng WANG ,  Jun-li LIN ,  Shao-Wei FU ,  Yi-Chen LIN

IPC: G01R31/28 ,  G01R31/307

Abstract: Systems and structures for venting and flow conditioning operations in charged particle beam systems. In some embodiments, a system may include a chamber configured to provide a vacuum environment; a vent valve; and a mass flow controller coupled to the chamber on a first side of the mass flow controller and to the vent valve on a second side of the mass flow controller.

公开(公告)号：US20240014053A1

公开(公告)日：2024-01-11

申请号：US18021537

申请日：2021-08-16

Applicant: ASML Netherlands B.V.

Inventor： Dongchi YU ,  Erheng WANG

IPC: H01L21/67 ,  H01J37/32 ,  H01L21/677

CPC classification number: H01L21/67201 ,  H01J37/32449 ,  H01L21/67742 ,  H01J37/32981

Abstract: A load-lock system may include a chamber enclosing a supporting structure configured to support a wafer; a gas vent arranged at a ceiling of the chamber and configured to vent gas into the chamber with a flow rate of at least twenty normal liters per minute; and a plate fixed to the ceiling between the gas vent and the wafer.