公开(公告)号：US20150338753A1

公开(公告)日：2015-11-26

申请号：US14409048

申请日：2013-06-13

Applicant: ASML Netherlands B.V.

Inventor： Michel RIEPEN ,  Dzmitry LEBETSKI ,  Wilbert Jan MESTROM ,  Wim Ronald KAMPINGA ,  Jan Okke NIEUWENKAMP ,  Jacob BRINKERT ,  Henricus Jozef CASTELIJNS ,  Nicolaas TEN KATE ,  Hendrikus Gijsbertus SCHIMMEL ,  Hans JANSEN ,  Dennis Jozef Maria PAULUSSEN ,  Brian Vernon VIRGO ,  Reinier Theodorus Martinus JILISEN ,  Ramin BADIE ,  Albert Pieter RIJPMA ,  Johannes Christiaan Leonardus FRANKEN ,  Peter VAN PUTTEN ,  Gerrit VAN DER STRAATEN

IPC: G03F7/20 ,  G21K5/08 ,  F15D1/00 ,  H05G2/00

CPC classification number: G03F7/70983 ,  F15D1/0065 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/06 ,  G21K5/08 ,  H05G2/005 ,  H05G2/008 ,  Y10T137/206

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Abstract translation: 一种辐射源，包括燃料源，其构造成将燃料输送到燃料发射EUV辐射的位置。 辐射源还包括设置有多个凹槽的不动的燃料碎屑接收表面。 凹槽具有定向，其布置成在一个或多个所需方向上在重力的影响下引导液体燃料的流动。

公开(公告)号：US20250155820A1

公开(公告)日：2025-05-15

申请号：US19020768

申请日：2025-01-14

Applicant: ASML Netherlands B.V.

Inventor： Remco Johannes Elisa HEIJMANS ,  Gerrit VAN DER STRAATEN ,  Ivo VANDERHALLEN ,  Jan Steven Christiaan WESTERLAKEN

IPC: G03F7/00 ,  H05G2/00

Abstract: A radiation source for an EUV lithography apparatus is disclosed. The radiation source comprises a chamber comprising a plasma formation region, a radiation collector arranged in the chamber and configured to collect radiation emitted at the plasma formation region and to direct the collected radiation towards an intermediate focus region, and a radiation conduit disposed between the radiation collector and the intermediate focus region. The radiation conduit comprises at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow, and at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow. Also disclosed is a method of reducing debris and/or vapor deposition in the radiation conduit by providing a protective gas flow to the at least one outlet of the radiation conduit.

公开(公告)号：US20220390852A1

公开(公告)日：2022-12-08

申请号：US17764865

申请日：2020-09-08

Applicant: ASML Netherlands B.V.

Inventor： Remco Johannes Elisa HEIJMANS ,  Gerrit VAN DER STRAATEN ,  Ivo VANDERHALLEN ,  Jan Steven Christiaan WESTERLAKEN

IPC: G03F7/20 ,  H05G2/00

Abstract: A radiation source for an EUV lithography apparatus is disclosed. The radiation source comprises a chamber comprising a plasma formation region, a radiation collector arranged in the chamber and configured to collect radiation emitted at the plasma formation region and to direct the collected radiation towards an intermediate focus region, and a radiation conduit disposed between the radiation collector and the intermediate focus region. The radiation conduit comprises at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow, and at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow. Also disclosed is a method of reducing debris and/or vapor deposition in the radiation conduit by providing a protective gas flow to the at least one outlet of the radiation conduit.