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    Radiation Collector, Radiation Source and Lithographic Apparatus
    1.
    发明申请
    Radiation Collector, Radiation Source and Lithographic Apparatus 审中-公开
    辐射收集器，辐射源和平版印刷设备

    公开(公告)号：US20160041374A1

    公开(公告)日：2016-02-11

    申请号：US14780151

    申请日：2014-03-24

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Ivo VANDERHALLEN ,  Alexander Matthijs STRUYCKEN ,  Johannes Christiaan Leonardu FRANKEN

    IPC: G02B19/00 ,  G02B7/18 ,  G02B5/09 ,  G02B27/00 ,  G03F7/20 ,  G02B5/10

    CPC classification number: G02B19/0023 ,  G02B5/09 ,  G02B5/10 ,  G02B7/1815 ,  G02B19/009 ,  G02B27/0006 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70575 ,  G03F7/70891 ,  G03F7/7095

    Abstract: A radiation collector (141) comprising a plurality of reflective surfaces (400-405), wherein each of the plurality of reflective surfaces is coincident with part of one of a plurality of ellipsoids (40-45), wherein the plurality of ellipsoids have in common a first focus (12) and a second focus (16), each of the plurality of reflective surfaces coincident with a different one of the plurality of ellipsoids, wherein the plurality of reflective surfaces are configured to receive radiation originating from the first focus (12) and reflect the radiation to the second focus (16). An apparatus (820) shown in FIG. 11 comprising a cooling system (832) and a reflector (831), wherein the cooling system is configured to cool the reflector, the cooling system comprising: a porous structure (823) situated in thermal contact with the reflector, wherein the porous structure is configured to receive a coolant in a liquid phase state; a condenser (825) configured to receive coolant from (826) the porous structure in a vapour phase state, condense the coolant thereby causing the coolant to undergo a phase change to a liquid phase state and output the condensed coolant in the liquid phase state for entry (827) into the porous structure.

    Abstract translation: 一种辐射收集器（141），包括多个反射表面（400-405），其中所述多个反射表面中的每一个与多个椭圆体（40-45）中的一个的一部分重合，其中所述多个椭圆体 共同的第一焦点（12）和第二焦点（16），所述多个反射表面中的每一个与所述多个椭圆体中的不同的一个重合，其中所述多个反射表面被配置为接收源自所述第一焦点的辐射 12）并将辐射反射到第二焦点（16）。 图8所示的装置（820） 11，包括冷却系统（832）和反射器（831），其中所述冷却系统被配置为冷却所述反射器，所述冷却系统包括：与所述反射器热接触的多孔结构（823），其中所述多孔结构 被配置为接收处于液相状态的冷却剂; 冷凝器（825），被配置为以气相状态从（826）多孔结构接收冷却剂，冷凝冷却剂，从而使冷却剂经历相变至液相状态，并输出处于液相状态的冷凝的冷却剂 进入（827）进入多孔结构。

    CONNECTION ASSEMBLY
    2.
    发明公开
    CONNECTION ASSEMBLY 审中-公开

    公开(公告)号：US20240196504A1

    公开(公告)日：2024-06-13

    申请号：US18550841

    申请日：2022-02-21

    Applicant: ASML Netherlands B.V.

    Inventor： Ivo VANDERHALLEN

    IPC: H05G2/00 ,  G03F7/00

    CPC classification number: H05G2/006 ,  G03F7/70033 ,  G03F7/70808 ,  H05G2/005 ,  H05G2/008

    Abstract: There is described a connection assembly (24) for a high-pressure liquid metal supply system used in an EUV light source comprising a monolithic block, wherein the monolithic block includes: at least one connection (21) for connecting to a reservoir (18,19) configured to hold liquid metal: interior passages (25) configured to fluidly connect the at least one connection with at least two liquid metal outlets/inlets (22, 23): at least two freeze valves (15,16,17) configured to block a passage by solidifying liquid metal therein. Also described is a liquid metal storage assembly including such a connection assembly, a lithography apparatus including such a liquid metal storage assembly or such a connection assembly, as well as the use of such assemblies or apparatus in a lithographic apparatus or method.

    RADIATION CONDUIT
    3.
    发明申请
    RADIATION CONDUIT 有权

    公开(公告)号：US20250155820A1

    公开(公告)日：2025-05-15

    申请号：US19020768

    申请日：2025-01-14

    Applicant: ASML Netherlands B.V.

    Inventor： Remco Johannes Elisa HEIJMANS ,  Gerrit VAN DER STRAATEN ,  Ivo VANDERHALLEN ,  Jan Steven Christiaan WESTERLAKEN

    IPC: G03F7/00 ,  H05G2/00

    Abstract: A radiation source for an EUV lithography apparatus is disclosed. The radiation source comprises a chamber comprising a plasma formation region, a radiation collector arranged in the chamber and configured to collect radiation emitted at the plasma formation region and to direct the collected radiation towards an intermediate focus region, and a radiation conduit disposed between the radiation collector and the intermediate focus region. The radiation conduit comprises at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow, and at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow. Also disclosed is a method of reducing debris and/or vapor deposition in the radiation conduit by providing a protective gas flow to the at least one outlet of the radiation conduit.

    RADIATION CONDUIT
    4.
    发明申请
    RADIATION CONDUIT 有权

    公开(公告)号：US20220390852A1

    公开(公告)日：2022-12-08

    申请号：US17764865

    申请日：2020-09-08

    Applicant: ASML Netherlands B.V.

    Inventor： Remco Johannes Elisa HEIJMANS ,  Gerrit VAN DER STRAATEN ,  Ivo VANDERHALLEN ,  Jan Steven Christiaan WESTERLAKEN

    IPC: G03F7/20 ,  H05G2/00

    Abstract: A radiation source for an EUV lithography apparatus is disclosed. The radiation source comprises a chamber comprising a plasma formation region, a radiation collector arranged in the chamber and configured to collect radiation emitted at the plasma formation region and to direct the collected radiation towards an intermediate focus region, and a radiation conduit disposed between the radiation collector and the intermediate focus region. The radiation conduit comprises at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow, and at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow. Also disclosed is a method of reducing debris and/or vapor deposition in the radiation conduit by providing a protective gas flow to the at least one outlet of the radiation conduit.

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