公开(公告)号：US20140375974A1

公开(公告)日：2014-12-25

申请号：US14372950

申请日：2013-01-10

Applicant: ASML Netherlands B.V.

Inventor： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Vladimir Mihailovitch Krivtsun ,  Gerardus Hubertus Petrus Maria Swinkels ,  Michel Riepen ,  Hendrikus Gijsbertus Schimmel ,  Viacheslav Medvedev

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70166 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70916 ,  G21K1/067 ,  G21K2201/064 ,  H05G2/008

Abstract: A source-collector device is constructed and arranged to generate a radiation beam, The device includes a target unit constructed and arranged to present a target surface of plasma-forming material; a laser unit constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma from said plasma-forming material; a contaminant trap constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector comprising a plurality of grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter constructed and arranged to attenuate at least one wavelength range of the beam.

Abstract translation: 源极 - 集电极器件被构造和布置成产生辐射束。该器件包括构造和布置成呈现等离子体形成材料的目标表面的靶单元; 激光单元，其被构造和布置成产生被引导到所述目标表面上的辐射束，以便形成来自所述等离子体形成材料的等离子体; 构造和布置以减少由等离子体产生的颗粒污染物的传播的污染物阱; 辐射收集器，包括多个放射入射反射器，其布置成收集由等离子体发射的辐射并从其形成光束; 以及被构造和布置成衰减所述光束的至少一个波长范围的滤光器。

公开(公告)号：US09411238B2

公开(公告)日：2016-08-09

申请号：US14372950

申请日：2013-01-10

Applicant: ASML Netherlands B.V.

Inventor： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Vladimir Mihailovitch Krivtsun ,  Gerardus Hubertus Petrus Maria Swinkels ,  Michel Riepen ,  Hendrikus Gijsbertus Schimmel ,  Viacheslav Medvedev

IPC: H05G2/00 ,  G03F7/20 ,  G21K1/06

CPC classification number: G03F7/70033 ,  G03F7/70166 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70916 ,  G21K1/067 ,  G21K2201/064 ,  H05G2/008

Abstract: A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.

Abstract translation: 源极 - 集电极器件包括具有等离子体形成材料的靶表面的靶单元和用于产生被引导到靶表面上的辐射束以形成来自所述等离子体形成材料的等离子体的激光单元。 提供污染物阱以减少由等离子体产生的颗粒污染物的传播。 辐射收集器包括一个或多个放射入射反射器，其布置成收集由等离子体发射的辐射并从其形成光束，并且滤光器被配置为衰减光束的至少一个波长范围。