公开(公告)号：US20040099816A1

公开(公告)日：2004-05-27

申请号：US10300898

申请日：2002-11-21

Applicant: ASML U.S. LLC

Inventor： Stephen Roux

IPC: H01J061/12

CPC classification number: G03F7/70908 ,  G03F7/70858 ,  G03F7/70916

Abstract: A system and method are used to isolate a first gas from a second gas using a third gas. A first chamber includes an element that emits light based on a first gas. A second chamber uses the emitted light to perform a process and includes the second gas. A gaslock that couples the first chamber to the second chamber. A gas source supplies a third gas between the first and the second gas in the gaslock, such that the first gas is isolated from the second gas in the gaslock. The first and third gas can be pumped from the first chamber and separated from one another, such that the first gas can be recycled for reuse to form the emitting light.

Abstract translation: 使用系统和方法使用第三气体将第一气体与第二气体隔离。 第一室包括基于第一气体发光的元件。 第二室使用发射的光进行处理并且包括第二气体。 将第一室耦合到第二室的气闸。 气体源在气闸中的第一和第二气体之间提供第三气体，使得第一气体与气闸中的第二气体隔离。 第一和第三气体可以从第一室泵送并彼此分离，使得第一气体可以被再循环以重新使用以形成发射光。