Sputter-type penning discharge for metallic ions
    1.
    发明授权
    Sputter-type penning discharge for metallic ions 失效
    用于金属离子的溅射型放电放电

    公开(公告)号:US3566185A

    公开(公告)日:1971-02-23

    申请号:US3566185D

    申请日:1969-03-12

    Inventor: GAVIN BASIL F

    CPC classification number: H01J27/06 Y10S422/906

    Abstract: An ion source in which ions of normally solid materials are easily produced. A plasma is generated in a gas adjacent the solid material from which ions are to be produced. The solid is negatively charged and the gas plasma ions bombard the solid, sputtering off ions of the solid. This is accomplished through the use of a Penning discharge with a cold cathode-type source and a centrally positioned and negatively charged dynode upon which the solid material is mounted, the dynode being electrically connected to the cathode and provided with an exit slit through which the metallic ions are extracted from plasma potential.

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