Sputter-type penning discharge for metallic ions
    1.
    发明授权
    Sputter-type penning discharge for metallic ions 失效
    用于金属离子的溅射型放电放电

    公开(公告)号:US3566185A

    公开(公告)日:1971-02-23

    申请号:US3566185D

    申请日:1969-03-12

    Inventor: GAVIN BASIL F

    CPC classification number: H01J27/06 Y10S422/906

    Abstract: An ion source in which ions of normally solid materials are easily produced. A plasma is generated in a gas adjacent the solid material from which ions are to be produced. The solid is negatively charged and the gas plasma ions bombard the solid, sputtering off ions of the solid. This is accomplished through the use of a Penning discharge with a cold cathode-type source and a centrally positioned and negatively charged dynode upon which the solid material is mounted, the dynode being electrically connected to the cathode and provided with an exit slit through which the metallic ions are extracted from plasma potential.

    Plasma reflex discharge device
    2.
    发明授权
    Plasma reflex discharge device 失效
    等离子体反射放电装置

    公开(公告)号:US4080549A

    公开(公告)日:1978-03-21

    申请号:US702521

    申请日:1976-07-06

    CPC classification number: H05H1/22 H01J17/38 H01J27/06

    Abstract: A high energy discharge apparatus uses a generally electron transparent thin foil anode of various configuration which is arranged parallel to and spaced apart between a pair of cathodes, and energized to create a potential difference between the anodes and cathodes causing electrons to be reflected back and forth through the foil anode with the concurrent discharge of ions being accelerated to the cathode.

    Abstract translation: 高能量放电装置使用一般电子透明的薄片状阳极,其各向同性地布置成平行并间隔开一对阴极,并且被激励以产生阳极和阴极之间的电位差,导致电子反射回来 通过箔阳极与同时放电的离子被加速到阴极。

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