公开(公告)号：US3675021A

公开(公告)日：1972-07-04

申请号：US3675021D

申请日：1969-09-19

Applicant: ATOMIC ENERGY COMMISSION ISRAE

Inventor： ALADJEM ABRAHAM

IPC: H01J5/18 ,  H01J47/00 ,  G21H5/00

CPC classification number: H01J5/18 ,  H01J47/00

Abstract: The invention provides metal oxide film structures for use as radioactive radiation windows, membranes of electrolytic cells and other purposes. The structures consist of an annular, or other closed frame of tantalum, niobium, tungsten or zirconium integral with a thin film of an oxide of the same metal, which spans the area enclosed by the frame. The structure is manufactured by subjecting a blank of the metal concerned, centrally masked on the larger part of the surface, to an anodizing treatment producing the oxide on all not-masked parts, removing the mask and subjecting the oxide-covered blank, as anode, to an electrolytic process by which the not-oxidized metal except the marginal portion, which constitutes the frame, is dissolved.

Abstract translation: 本发明提供了用作放射性辐射窗口，电解池膜和其它目的的金属氧化物膜结构。 这些结构由一个环状或其他封闭的钽，铌，钨或锆的框架构成，该框架与同一金属的氧化物的薄膜成一体，跨越由框架包围的区域。 该结构是通过对所有未被掩模的部件上的氧化物进行阳极氧化处理，将相关金属的坯料进行中心掩蔽的方法制造，除去掩模并使氧化物被覆盖的坯料作为阳极 涉及除构成框架的边缘部分以外的未被氧化的金属溶解的电解方法。