公开(公告)号：US11227743B2

公开(公告)日：2022-01-18

申请号：US16996020

申请日：2020-08-18

Applicant: ATTOLIGHT AG

Inventor： Julien Vincent Pilet ,  Jean Berney

IPC: H01J37/28 ,  H01J37/153 ,  H01J37/244

Abstract: A scanning electron microscope having a spectrometer with a sensor having a plurality of pixels, wherein the spectrometer directs different wavelengths of collected light onto different pixels. An optical model is formed and an error function is minimized to find values for the model, such that wavelength detection may be corrected using the model. The model can correct for errors generated by effects such as the motion of the electron beam over the specimen, aberrations introduced by optical elements, and imperfections of the optical elements. A correction function may also be employed to account for effects not captured by the optical model.

公开(公告)号：US20240412938A1

公开(公告)日：2024-12-12

申请号：US18393329

申请日：2023-12-21

Applicant: ATTOLIGHT AG

Inventor： Nicolas Tappy ,  Christian Monachon ,  Anna Fontcuberta i Morral ,  Jean Berney

IPC: H01J37/073 ,  H01J37/12 ,  H01J37/22 ,  H01J37/26

Abstract: An electron emitter comprises a tapered-shaped emission tip having a base face and an apex opposite the base face, the emission tip consisting essentially of semiconductor material, the semiconductor material being partially doped n-type and partially doped p-type, wherein the base face is doped one of n-type or p-type and the apex is doped opposite type of the base face and a p-n junction is thereby formed at a position between the base face and the apex.

公开(公告)号：US20210057183A1

公开(公告)日：2021-02-25

申请号：US16996020

申请日：2020-08-18

Applicant: ATTOLIGHT AG

Inventor： Julien Vincent Pilet ,  Jean Berney

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/153

Abstract: A scanning electron microscope having a spectrometer with a sensor having a plurality of pixels, wherein the spectrometer directs different wavelengths of collected light onto different pixels. An optical model is formed and an error function is minimized to find values for the model, such that wavelength detection may be corrected using the model. The model can correct for errors generated by effects such as the motion of the electron beam over the specimen, aberrations introduced by optical elements, and imperfections of the optical elements. A correction function may also be employed to account for effects not captured by the optical model.