公开(公告)号：US11835447B1

公开(公告)日：2023-12-05

申请号：US18366835

申请日：2023-08-08

Applicant: AUROS TECHNOLOGY, INC.

Inventor： Tae Dong Kang

IPC: G01B11/28 ,  G01N21/21

CPC classification number: G01N21/211 ,  G01N2021/213 ,  G01N2201/126

Abstract: A method for measuring a characteristic of a thin film is disclosed. The method includes a) obtaining a measured spectrum from a target region on the substrate by using a spectroscopic ellipsometer, b) obtaining a physical model capable of obtaining an estimated parameter value related to the characteristic of the thin film through regression analysis of the measured spectrum, c) obtaining a machine learning model capable of obtaining a reference parameter value related to the characteristic of the thin film by using the measured spectrum, and d) obtaining an integrated model which uses an integrated error function capable of considering both of a first error function and a second error function, and obtaining an optimum parameter value through regression analysis of the integrated model.