公开(公告)号：US20020186477A1

公开(公告)日：2002-12-12

申请号：US09878800

申请日：2001-06-11

Applicant: AXSUN Technologies, Inc.

Inventor： Xiaomei Wang ,  Peter S. Whitney ,  Steven F. Nagle ,  Dale C. Flanders

IPC: G02B007/02

CPC classification number: G02B6/423

Abstract: An optical system assembly technique utilizes a templating system for locating optical components 200 on optical benches 150. Specifically, the template system comprises a template substrate 102 that is placed over the optical bench. The substrate 102 has at least one alignment slot 104 that is formed through the substrate. This alignment slot 104 has an alignment feature 120, against which an optical component 200 is registered. In order to improve the accuracy of the alignment of the optical component on the optical bench, the slot 104 has a reentrant, such as a smooth or step, sidewall 106 extending from the alignment feature 120 into the template substrate 102. This way, there is a single point or near single point of contact between the optical component 200 and the template 102, to thereby improve the placement precision for the optical component on the optical bench 150.

Abstract translation: 光学系统组装技术利用模板系统来定位光学台架150上的光学组件200.具体地，模板系统包括放置在光学台上的模板衬底102。 衬底102具有通过衬底形成的至少一个对准槽104。 该对准狭槽104具有对准特征120，光学部件200对准该对准特征120。 为了提高光学部件在光学工作台上的对准精度，狭槽104具有从对准特征120延伸到模板衬底102中的凹槽，例如平滑或台阶侧壁106。这样，那里 是光学部件200和模板102之间的单点或近点接触点，从而提高光学部件150上的光学部件的放置精度。

公开(公告)号：US20020048839A1

公开(公告)日：2002-04-25

申请号：US09954861

申请日：2001-09-18

Applicant: AXSUN Technologies, Inc.

Inventor： Michael F. Miller ,  Minh Van Le ,  Christopher C. Cook ,  Dale C. Flanders ,  Steven F. Nagle

IPC: H01L021/00

CPC classification number: B81B3/0083 ,  B81B2201/042 ,  B81B2201/047 ,  B81C1/0038 ,  B81C2201/0159 ,  B81C2201/053 ,  B81C2201/056 ,  G02B26/001

Abstract: A process for patterning dielectric layers of the type typically found in optical coatings in the context of MEMS manufacturing is disclosed. A dielectric coating is deposited over a device layer, which has or will be released, and patterned using a mask layer. In one example, the coating is etched using the mask layer as a protection layer. In another example, a lift-off process is shown. The primary advantage of photolithographic patterning of the dielectric layers in optical MEMS devices is that higher levels of consistency can be achieved in fabrication, such as size, location, and residual material stress. Competing techniques such as shadow masking yield lower quality features and are difficult to align. Further, the minimum feature size that can be obtained with shadow masks is limited to null100 nullm, depending on the coating system geometry, and they require hard contact with the surface of the wafer, which can lead to damage and/or particulate contamination.

Abstract translation: 公开了一种用于在MEMS制造的上下文中通常在光学涂层中发现的类型的介电层图案的工艺。 电介质涂层沉积在器件层上，器件层已经或将被释放，并使用掩模层进行图案化。 在一个实例中，使用掩模层作为保护层来蚀刻涂层。 在另一示例中，示出了剥离过程。 光学MEMS器件中电介质层的光刻图案的主要优点是可以在诸如尺寸，位置和残余材料应力的制造中实现更高水平的稠度。 诸如阴影掩蔽的竞争技术产生较低的质量特征并且难以对准。 此外，根据涂层系统的几何形状，使用荫罩可获得的最小特征尺寸限制在〜100μm，并且它们需要与晶片的表面硬接触，这可能导致损坏和/或微粒污染。

公开(公告)号：US20040218509A1

公开(公告)日：2004-11-04

申请号：US10840814

申请日：2004-05-08

Applicant: Axsun Technologies, Inc.

Inventor： Dale C. Flanders ,  Steven F. Nagle ,  Margaret B. Stern

IPC: G11B007/24

CPC classification number: G02B26/001 ,  G02B5/1828 ,  G02B26/02 ,  G02B26/0833 ,  G02B26/0875

Abstract: An optical membrane device and method for making such a device are described. This membrane is notable in that it comprises an optically curved surface. In some embodiments, this curved optical surface is optically concave and coated, for example, with a highly reflecting (HR) coating to create a curved mirror. In other embodiments, the optical surface is optically convex and coated with, preferably, an antireflective (AR) coating to function as a refractive or diffractive lens.

Abstract translation: 对光学膜装置及其制造方法进行说明。 该膜是显着的，因为它包括光学曲面。 在一些实施例中，该弯曲的光学表面是光学凹入的并且例如用高反射（HR）涂层涂覆以形成弯曲的镜。 在其它实施例中，光学表面是光学凸起的并且涂覆有优选抗反射（AR）涂层，用作折射或衍射透镜。