REFLECTOR FOR PROCESS CHAMBER
    1.
    发明公开

    公开(公告)号:US20240352618A1

    公开(公告)日:2024-10-24

    申请号:US18418531

    申请日:2024-01-22

    CPC classification number: C30B25/10 B08B7/0071

    Abstract: A reflector for use in a semiconductor process chamber is provided including: a body; and a bottom plate connected to a lower portion of the body, the bottom plate having a bottom surface, a top surface, and one or more side surfaces connecting the bottom surface with the top surface. A cross section of the bottom plate that extends to opposing locations on the one or more side surfaces includes a center, the cross section is divided into two or more sectors that extend from the center of the cross section, and the cross section includes a cooling channel comprising an inlet and one or more outlets.

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