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公开(公告)号：US20220357655A1
公开(公告)日：2022-11-10
申请号：US17655583
申请日：2022-03-21
Applicant: Applied Materials, Inc.
Inventor： David SELL , Samarth BHARGAVA
Abstract: Embodiments of the present disclosure generally relate to methods of forming a substrate having a target thickness distribution at one or more eyepiece areas across a substrate. The substrate includes eyepiece areas corresponding to areas where optical device eyepieces are to be formed on the substrate. Each eyepiece area includes a target thickness distribution. A base substrate thickness distribution of a base substrate is measured such that a target thickness change can be determined. The methods described herein are utilized along with the target thickness change to form a substrate with the target thickness distribution.
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Patent Agency Ranking
公开(公告)号：US20230117647A1
公开(公告)日：2023-04-20
申请号：US17949292
申请日：2022-09-21
Applicant: Applied Materials, Inc.
Inventor： Kevin MESSER , David SELL , Samarth BHARGAVA
Abstract: A rainbow-free waveguide display, a near-eye display incorporating the rainbow-free waveguide, and methods of manufacturing the rainbow-free waveguide are provided. The display includes a waveguide display configured to direct image light to an eyebox plane having a length (LEyebox) and to a user's eye. The waveguide display includes a waveguide combiner and an out-coupler grating, wherein the out-coupler grating has a grating period ΛOC such that all angles of incidence θin of light from an external light source, result in diffracted angles θout, that miss the user's eye.
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公开(公告)号：US20230121211A1
公开(公告)日：2023-04-20
申请号：US17955185
申请日：2022-09-28
Applicant: Applied Materials, Inc.
Inventor： Jianji YANG , David SELL , Samarth BHARGAVA , Guannan CHEN
Abstract: Embodiments of the present disclosure generally relate to metasurface devices and methods of forming metasurfaces. The metasurface devices include a plurality of device structures. Each of the device structures are formed from multiple layers, at least one of which is an impedance matching layer. The impedance matching layer may be formed as either an inner impedance matching layer between the substrate and the device layer or as a separate outer impedance matching layer on top of the device layer. The refractive indices of the impedance matching layers are chosen to be between the refractive index of the mediums on either side of the impedance matching layer.
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公开(公告)号：US20230120539A1
公开(公告)日：2023-04-20
申请号：US17949526
申请日：2022-09-21
Applicant: Applied Materials, Inc.
Inventor： Jianji YANG , Samarth BHARGAVA , David SELL
Abstract: A method of forming a plurality of gratings for an optical device structure are provided. The method utilizes a high refractive index material and a metallic coating.
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公开(公告)号：US20220357654A1
公开(公告)日：2022-11-10
申请号：US17315613
申请日：2021-05-10
Applicant: Applied Materials, Inc.
Inventor： David SELL , Samarth BHARGAVA
Abstract: Embodiments of the present disclosure generally relate to methods of forming a substrate having a target thickness distribution at one or more eyepiece areas across a substrate. The substrate includes eyepiece areas corresponding to areas where optical device eyepieces are to be formed on the substrate. Each eyepiece area includes a target thickness distribution. A base substrate thickness distribution of a base substrate is measured such that a target thickness change can be determined. The methods described herein are utilized along with the target thickness change to form a substrate with the target thickness distribution.
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公开(公告)号：US20220308460A1
公开(公告)日：2022-09-29
申请号：US17701394
申请日：2022-03-22
Applicant: Applied Materials, Inc.
Inventor： Yongan XU , Naamah ARGAMAN , David SELL , Ludovic GODET
Abstract: Methods of fabricating large-scale optical devices having sub-micron dimensions are provided. A method is provided that includes projecting a beam to a mask, the mask corresponding to a section of an optical device pattern, the optical device pattern divided into four or more equal portions, each portion corresponding to a section of a substrate. The method further includes scanning the mask over a first section of the substrate to pattern a first portion of the optical device pattern, the substrate is positioned at a first rotation angle relative to the mask. The method further includes rotating the substrate to a second rotation angle, the second rotation angle corresponding to 360° divided by a total number of portions of the optical device pattern, scanning the mask over a second section of the substrate from the initial position to the final position to pattern a second portion of the optical device pattern.
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