公开(公告)号：US20210123156A1

公开(公告)日：2021-04-29

申请号：US17016614

申请日：2020-09-10

Applicant: Applied Materials, Inc.

Inventor： Zihao YANG ,  Mingwei ZHU ,  Nag B. PATIBANDLA ,  Yong CAO ,  Shumao ZHANG ,  Zhebo CHEN ,  Jean LU ,  Daniel Lee DIEHL ,  Xianmin TANG

IPC: C30B23/00 ,  C30B29/40 ,  C30B33/04 ,  C23C14/06 ,  C23C14/34 ,  C23C14/54 ,  C23C14/58

Abstract: Embodiments described herein include a method for depositing a material layer on a substrate while controlling a bow of the substrate and a surface roughness of the material layer. A bias applied to the substrate while the material layer is deposited is adjusted to control the bow of the substrate. A bombardment process is performed on the material layer to improve the surface roughness of the material layer. The bias and bombardment process improve a uniformity of the material layer and reduce an occurrence of the material layer cracking due to the bow of the substrate.