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公开(公告)号:US20230367288A1
公开(公告)日:2023-11-16
申请号:US17745730
申请日:2022-05-16
Applicant: Applied Materials, Inc.
Inventor: Jeong Jin Hong , Mi Hyun Jang , Sidharth Bhatia , Sejune Cheon , Joshua Maher , Upendra Ummethala
IPC: G05B19/4099
CPC classification number: G05B19/4099 , G05B2219/45031
Abstract: Embodiments disclosed herein include a method for use with a semiconductor processing tool. In an embodiment, the method comprises configuring the semiconductor processing tool, running a benchmark test on the semiconductor processing tool, providing hardware operating window (HOW) analytics, generating a design of experiment (DoE) using the HOW analytics, implementing process optimization, and releasing an iteration of the process recipe. In an embodiment, the method further comprises margin testing the iteration of the process recipe.
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公开(公告)号:US20230237412A1
公开(公告)日:2023-07-27
申请号:US17586700
申请日:2022-01-27
Applicant: Applied Materials, Inc.
Inventor: Sejune Cheon , Jeong Jin Hong , Mikyung Shim , Xiaoqun Zou , Jinkyeong Lee , Sang Hong Kim
CPC classification number: G06Q10/0639 , G06N3/084 , G06Q50/04
Abstract: A method includes receiving trace sensor data associated with a first manufacturing process of a manufacturing chamber. The method further includes processing the trace sensor data by a processing device to generate summary data associated with the trace sensor data. The method further includes generating a quality index score based on the summary data. The method further includes providing an alert to a user based on the quality index score. The alert includes an indication that the manufacturing chamber performance does not meet a first threshold.
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公开(公告)号:US20230185255A1
公开(公告)日:2023-06-15
申请号:US17551180
申请日:2021-12-14
Applicant: Applied Materials, Inc.
Inventor: Jeong Jin Hong , Mihyun Jang
CPC classification number: G05B13/048 , G05B13/0265 , G06K9/6256 , G06N5/003 , H01L21/67207
Abstract: The subject matter of this specification can be implemented in, among other things, methods, systems, computer-readable storage medium. A method can include a processing device receiving sensor data indicating a state of an environment of a processing chamber processing a series of substrates according to a substrate processing procedure. The series of substrates may be processed subsequent to a preventive maintenance procedure. The processing device may determine a first set of values based on the sensor data. The set of values may indicate a likelihood an associated substrate comprises a first process result that meets a threshold condition of the substrate processing procedure. The processing device may further predict a first test result based on the first set of values. The first test result may indicate a likelihood a first substrate processed subsequent to processing the series of substrates comprises a second process result that meets the threshold condition.
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公开(公告)号:US20240394509A1
公开(公告)日:2024-11-28
申请号:US18201921
申请日:2023-05-25
Applicant: APPLIED MATERIALS, INC.
Inventor: Sejune Cheon , Sang Hong Kim , Jeong Jin Hong
Abstract: A method includes processing measurement data of a substrate that was processed according to a manufacturing process using a first trained machine learning model to predict a critical dimension (CD) profile for the substrate. The method further includes generating a CD profile prediction image based on the predicted CD profile for the substrate. The method further includes processing the CD profile prediction image using a second trained machine learning model to generate a synthetic microscopy image associated with the substrate.
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公开(公告)号:US20240393262A1
公开(公告)日:2024-11-28
申请号:US18201927
申请日:2023-05-25
Applicant: APPLIED MATERIALS, INC.
Inventor: Jeong Jin Hong , Sejune Cheon , Sang Hong Kim , Thomas Ho Fai Li , Anders Andelman Nottrott , Zhaozhao Zhu , MiHyun Jang
Abstract: A method includes receiving spectral data of a substrate and metrology data corresponding to the spectral data of the substrate. The method further includes determining a plurality of feature model configurations for each of a plurality of feature models, each of the plurality of feature model configurations including one or more feature model conditions. The method further includes determining a plurality of feature model combinations, where each feature model combination of the plurality of feature model combinations includes a subset of the plurality of feature model configurations. The method further includes generating a plurality of input datasets, where each input dataset of the plurality of input datasets is generated based on application of the spectral data to a respective feature model combination of the plurality of feature model combinations. The method further includes training a plurality of machine learning models, where each machine learning model is trained to generate an output using an input dataset of the plurality of input datasets and the metrology data. The method further includes selecting a trained machine learning model from the plurality of trained machine learning models satisfying one or more selection criteria.
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公开(公告)号:US20230236586A1
公开(公告)日:2023-07-27
申请号:US17586702
申请日:2022-01-27
Applicant: Applied Materials, Inc.
Inventor: Sejune Cheon , Jeong Jin Hong , Mikyung Shim , Xiaoqun Zou , Jinkyeong Lee , Sang Hong Kim
IPC: G05B19/418
CPC classification number: G05B19/41875 , G05B2219/32194 , G05B2219/32193
Abstract: A method includes receiving trace sensor data associated with a first manufacturing process of a processing chamber. The method further includes processing the trace sensor data using one or more trained machine learning models that generate a representation of the trace sensor data, and then generate reconstructed sensor data based on the representation of the trace sensor data. The method further includes comparing the trace sensor data to the reconstructed sensor data. The method further includes determining one or more differences between the reconstructed sensor data and the trace sensor data. The method further includes determining whether to recommend a corrective action associated with the processing chamber based on the one or more differences between the trace sensor data and the reconstructed sensor data.
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公开(公告)号:US20250021064A1
公开(公告)日:2025-01-16
申请号:US18902653
申请日:2024-09-30
Applicant: APPLIED MATERIALS, INC.
Inventor: Jeong Jin Hong , Mihyun Jang
IPC: G05B13/04 , G05B13/02 , G06F18/214 , G06N5/01 , H01L21/67
Abstract: Data associated with processing a series of substrates according to a substrate processing procedure is identified. First predictive data indicating a likelihood that the series of substrates satisfies one or more conditions of the substrate processing procedure is determined based on the identified data. Second predictive data indicating a likelihood that an additional substrate for processing subsequent to processing the series of substrates satisfies the one or more conditions is determined based on the first predictive data. One or more settings of an operation of the substrate processing procedure are altered based on the first predictive data and the second predictive data. The altered one or more settings cause the additional substrate processed subsequent to processing the series of substrates to satisfy the one or more conditions.
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公开(公告)号:US12135529B2
公开(公告)日:2024-11-05
申请号:US17551180
申请日:2021-12-14
Applicant: Applied Materials, Inc.
Inventor: Jeong Jin Hong , Mihyun Jang
IPC: G05B13/04 , G05B13/02 , G06F18/214 , G06N5/01 , H01L21/67
Abstract: The subject matter of this specification can be implemented in, among other things, methods, systems, computer-readable storage medium. A method can include a processing device receiving sensor data indicating a state of an environment of a processing chamber processing a series of substrates according to a substrate processing procedure. The series of substrates may be processed subsequent to a preventive maintenance procedure. The processing device may determine a first set of values based on the sensor data. The set of values may indicate a likelihood an associated substrate comprises a first process result that meets a threshold condition of the substrate processing procedure. The processing device may further predict a first test result based on the first set of values. The first test result may indicate a likelihood a first substrate processed subsequent to processing the series of substrates comprises a second process result that meets the threshold condition.
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公开(公告)号:US20240273443A1
公开(公告)日:2024-08-15
申请号:US18634705
申请日:2024-04-12
Applicant: Applied Materials, Inc.
Inventor: Sejune Cheon , Jeong Jin Hong , Mikyung Shim , Xiaoqun Zou , Jinkyeong Lee , Sang Hong Kim
IPC: G06Q10/0639 , G06N3/084 , G06Q50/04
CPC classification number: G06Q10/0639 , G06N3/084 , G06Q50/04
Abstract: A method includes receiving trace sensor data associated with a first manufacturing process of a manufacturing chamber. The method further includes processing the trace sensor data by a processing device to generate summary data associated with the trace sensor data. Generating the summary data includes identifying a steady state and transient portion of the trace sensor data and generating a first and second portion of summary data based on the steady state and transient portions. The method further includes generating a quality index score based on the summary data. The method further includes providing an alert to a user based on the quality index score. The alert includes an indication that the manufacturing chamber performance does not meet a first threshold.
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公开(公告)号:US11961030B2
公开(公告)日:2024-04-16
申请号:US17586700
申请日:2022-01-27
Applicant: Applied Materials, Inc.
Inventor: Sejune Cheon , Jeong Jin Hong , Mikyung Shim , Xiaoqun Zou , Jinkyeong Lee , Sang Hong Kim
IPC: G06Q10/0639 , G06N3/084 , G06Q50/04
CPC classification number: G06Q10/0639 , G06N3/084 , G06Q50/04
Abstract: A method includes receiving trace sensor data associated with a first manufacturing process of a manufacturing chamber. The method further includes processing the trace sensor data by a processing device to generate summary data associated with the trace sensor data. The method further includes generating a quality index score based on the summary data. The method further includes providing an alert to a user based on the quality index score. The alert includes an indication that the manufacturing chamber performance does not meet a first threshold.
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