公开(公告)号：US20240263299A1

公开(公告)日：2024-08-08

申请号：US18106365

申请日：2023-02-06

Applicant: Applied Materials, Inc.

Inventor： Karunakaran NATARAJ ,  Sathiyamurthi GOVINDASAMY ,  Suresh PALANISAMY ,  Harish V. PENMETHSA ,  Naresh Kumar ASOKAN

IPC: C23C14/50 ,  C23C14/52

CPC classification number: C23C14/505 ,  C23C14/52

Abstract: Apparatus and methods for flipping substrates in vacuum between PVD sputtering of each side for increasing throughput are provided herein. In some embodiments disclosed herein, a module of a processing system for flipping a substrate in vacuum is provided. The module includes a clamp assembly for securing the substrate, a motor assembly coupled to the substrate clamp assembly, for rotating the clamp assembly, a lift pin assembly, and a lift pin actuator for raising and lowering the lift pin assembly.

公开(公告)号：US20240282558A1

公开(公告)日：2024-08-22

申请号：US18110668

申请日：2023-02-16

Applicant: Applied Materials, Inc.

Inventor： Sathiyamurthi GOVINDASAMY ,  Harish V. PENMETHSA ,  Suresh PALANISAMY ,  Naresh Kumar ASOKAN ,  Karunakaran NATARAJ

IPC: H01J37/34

CPC classification number: H01J37/3408 ,  H01J37/3452 ,  H01J37/3455 ,  H01J2237/002

Abstract: Apparatus and methods for improving film uniformity in a physical vapor deposition (PVD) process are provided herein. In some embodiments, a magnetron translation assembly comprises a first linear actuator assembly with a first rail which is aligned in a first direction and a first actuator that is configured to position a first mount along the first rail; a magnet assembly is mounted on the first mount, the magnet assembly constructed and arranged to be rotated about an axis perpendicular to the first rail; and a second linear actuator assembly comprising a second mount that is configured to be positioned along a second rail, which is aligned in a second direction and the first linear actuator assembly is coupled to a mounting surface of the second mount.