公开(公告)号：US11868147B2

公开(公告)日：2024-01-09

申请号：US17198619

申请日：2021-03-11

Applicant: Applied Materials, Inc.

Inventor： Philip DiGiacomo ,  Sunil Kumar Garg ,  Paul G. Kiely ,  Keith A. Miller ,  Rajat Agrawal

IPC: G05D11/13 ,  G05B15/02 ,  G01N21/67

CPC classification number: G05D11/138 ,  G01N21/67 ,  G05B15/02

Abstract: A system may be configured to monitor an amount of a gas species in a processing chamber using Optical Emission Spectrometry. The gas measurement may be provided as feedback to a control process that generates a target setpoint for a gas flow controller into the process chamber. This real-time process may increase/decrease the flow rate of the gas in order to maintain a process deposition mode within a transition region between primarily metallic deposition and primarily compound deposition.

公开(公告)号：US20220291702A1

公开(公告)日：2022-09-15

申请号：US17198619

申请日：2021-03-11

Applicant: Applied Materials, Inc.

Inventor： Philip DiGiacomo ,  Sunil Kumar Garg ,  Paul G. Kiely ,  Keith A. Miller ,  Rajat Agrawal

IPC: G05D11/13 ,  G05B15/02 ,  G01N21/67

Abstract: A system may be configured to monitor an amount of a gas species in a processing chamber using Optical Emission Spectrometry. The gas measurement may be provided as feedback to a control process that generates a target setpoint for a gas flow controller into the process chamber. This real-time process may increase/decrease the flow rate of the gas in order to maintain a process deposition mode within a transition region between primarily metallic deposition and primarily compound deposition.

公开(公告)号：US20200035527A1

公开(公告)日：2020-01-30

申请号：US16592084

申请日：2019-10-03

Applicant: Applied Materials, Inc.

Inventor： Fuhong Zhang ,  Sunil Kumar Garg ,  Paul Kiely ,  Martin Lee Riker ,  William Fruchterman ,  Zheng Wang ,  Xiaodong Wang

IPC: H01L21/67 ,  G05B19/418 ,  G05B15/02

Abstract: Methods and apparatus to minimize electromagnetic interference between adjacent process chambers of a cluster tool are described. The start time of the subject recipe is controlled based on the electromagnetic process window of the subject process chamber, the electromagnetic window of the first adjacent process chamber and of an optional second adjacent process chamber. The start time of the subject process chamber is controlled to prevent temporal overlap of the electromagnetic window of the subject chamber with the electromagnetic window of an adjacent chamber.

公开(公告)号：US11335577B2

公开(公告)日：2022-05-17

申请号：US16592084

申请日：2019-10-03

Applicant: Applied Materials, Inc.

Inventor： Fuhong Zhang ,  Sunil Kumar Garg ,  Paul Kiely ,  Martin Lee Riker ,  William Fruchterman ,  Zheng Wang ,  Xiaodong Wang

IPC: H01L21/67 ,  G05B15/02 ,  G05B19/418

Abstract: Methods and apparatus to minimize electromagnetic interference between adjacent process chambers of a cluster tool are described. The start time of the subject recipe is controlled based on the electromagnetic process window of the subject process chamber, the electromagnetic window of the first adjacent process chamber and of an optional second adjacent process chamber. The start time of the subject process chamber is controlled to prevent temporal overlap of the electromagnetic window of the subject chamber with the electromagnetic window of an adjacent chamber.

公开(公告)号：US10438828B2

公开(公告)日：2019-10-08

申请号：US15718336

申请日：2017-09-28

Applicant: Applied Materials, Inc.

Inventor： Fuhong Zhang ,  Sunil Kumar Garg ,  Paul Kiely ,  Martin Lee Riker ,  William Fruchterman ,  Zheng Wang ,  Xiaodong Wang

IPC: H01L21/67 ,  G05B15/02 ,  G05B19/418

Abstract: Methods and apparatus to minimize electromagnetic interference between adjacent process chambers of a cluster tool are described. The start time of the subject recipe is controlled based on the electromagnetic process window of the subject process chamber, the electromagnetic window of the first adjacent process chamber and of an optional second adjacent process chamber. The start time of the subject process chamber is controlled to prevent temporal overlap of the electromagnetic window of the subject chamber with the electromagnetic window of an adjacent chamber.

公开(公告)号：US20180096871A1

公开(公告)日：2018-04-05

申请号：US15718336

申请日：2017-09-28

Applicant: Applied Materials, Inc.

Inventor： Fuhong Zhang ,  Sunil Kumar Garg ,  Paul Kiely ,  Martin Lee Riker ,  William Fruchterman ,  Zheng Wang ,  Xiaodong Wang

IPC: H01L21/67 ,  G05B15/02

CPC classification number: H01L21/67276 ,  G05B15/02 ,  G05B19/41865 ,  G05B2219/32275 ,  Y02P90/20

Abstract: Methods and apparatus to minimize electromagnetic interference between adjacent process chambers of a cluster tool are described. The start time of the subject recipe is controlled based on the electromagnetic process window of the subject process chamber, the electromagnetic window of the first adjacent process chamber and of an optional second adjacent process chamber. The start time of the subject process chamber is controlled to prevent temporal overlap of the electromagnetic window of the subject chamber with the electromagnetic window of an adjacent chamber.