Abstract:
The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be square or rectangular in shape. Generally, the optical system and methods of the present invention are used to preferentially anneal one or more regions found within the anneal regions by delivering enough energy to cause the one or more regions to re-melt and solidify.
Abstract:
A method and apparatus for decorrelating coherent light from a light source, such as a pulsed laser, in both time and space in an effort to provide intense and uniform illumination are provided. The techniques and apparatus described herein may be incorporated into any application where intense, uniform illumination is desired, such as pulsed laser annealing, welding, ablating, and wafer stepper illuminating.
Abstract:
Implementations disclosed herein generally relate to a light pipe, or kaleido, for homogenizing light such that the light is uniform once the light exits the light pipe. By reflecting the light inside the light pipe, light uniformity is increased. In one implementation, a light pipe for an image projection apparatus is provided. The light pipe comprises an elongated rectangular body having a refractive index that provides total internal reflection within the elongated rectangular body. The elongated rectangular body has an input face for accepting light into the elongated rectangular body. The input face disposed substantially orthogonal to a longitudinal axis of the elongated rectangular body. The elongated rectangular body has an output face for releasing light from the elongated rectangular body. The output face is disposed substantially orthogonal to the longitudinal axis. The elongated rectangular body has a twist along the longitudinal axis.
Abstract:
Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact apparatuses for projecting an image onto a substrate are provided. In one embodiment, an image projection apparatus includes a light pipe coupled to a first mounting plate, and a frustrated prism assembly, one or more digital micro-mirror devices, one or more beamsplitters, and one or more projection optics, which are coupled to a second mounting plate. The first and second mounting plates are coplanar, such that the image projection apparatus is compact and may be aligned in a system having a plurality of image projection apparatuses, each of which is easily removable and replaceable.