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    Optical resolution measurement method for optical devices
    2.
    发明授权
    Optical resolution measurement method for optical devices 有权

    公开(公告)号：US12165341B2

    公开(公告)日：2024-12-10

    申请号：US17534167

    申请日：2021-11-23

    Applicant: Applied Materials, Inc.

    Inventor： Jinxin Fu ,  Yangyang Sun ,  Ludovic Godet

    IPC: G06T7/521 ,  G06T1/00

    Abstract: Embodiments herein provide for a method of determining an optical device modulation transfer function (MTF). The method described herein includes projecting a baseline image of a pattern from a light engine to a detector. The baseline image is analyzed to determine a baseline function. A baseline fast Fourier transform (FFT) or a baseline MTF of the baseline function is obtained. The method further includes projecting an image of the pattern from the light engine to one or more optical devices. The pattern is outcoupled from the one or more optical devices to the detector. The image is analyzed to determine a function. A function FFT or a function MTF is obtained corresponding to the image. An optical device MTF of the one or more optical devices is determined by comparing the baseline FFT and the function FFT determined by analyzing the image or by comparing the baseline MTF and the function MTF determined by analyzing the image.

    Full-field metrology tool for waveguide combiners and meta-surfaces
    3.
    发明授权
    Full-field metrology tool for waveguide combiners and meta-surfaces 有权

    公开(公告)号：US12019242B2

    公开(公告)日：2024-06-25

    申请号：US17876195

    申请日：2022-07-28

    Applicant: Applied Materials, Inc.

    Inventor： Yangyang Sun ,  Jinxin Fu ,  Ludovic Godet

    IPC: G02B27/01

    CPC classification number: G02B27/0172 ,  G02B27/0176

    Abstract: Embodiments described herein provide for metrology tools and methods of obtaining a full-field optical field of an optical device to determine multiple metrology metrics of the optical device. A metrology tool is utilized to split a light beam into a first light path and a second light path. The first light path and the second light path are combined into a combined light beam and delivered to the detector. The detector measures the intensity of the combined light beam. A first equation and second equation are utilized in combination with the intensity measurements to determine an amplitude and phase ψ at a reference point directly adjacent to a second surface of the at least one optical device.

    Interference in-sensitive Littrow system for optical device structure measurement
    6.
    发明授权
    Interference in-sensitive Littrow system for optical device structure measurement 有权

    公开(公告)号：US12203747B2

    公开(公告)日：2025-01-21

    申请号：US18408193

    申请日：2024-01-09

    Applicant: Applied Materials, Inc.

    Inventor： Yangyang Sun ,  Jinxin Fu ,  Ludovic Godet

    IPC: G01B11/26

    Abstract: Embodiments described herein provide for devices and methods of measuring a pitch P of optical device structures and an orientation angle ϕ of the optical device structures. One embodiment of the system includes an optical arm coupled to an arm actuator. The optical arm includes a light source. The light source emits a light path operable to be diffracted to the stage. The optical arm further includes a first beam splitter and a second beam splitter positioned in the light path. The first beam splitter directs the light path through a first lens and the second beam splitter directs the light path through a first dove prism and a second lens. The optical arm further includes a first detector operable to detect the light path from the first lens and second detector operable to detect the light path from the second lens.

    Interference in-sensitive Littrow system for optical device structure measurement
    9.
    发明授权
    Interference in-sensitive Littrow system for optical device structure measurement 有权

    公开(公告)号：US11913776B2

    公开(公告)日：2024-02-27

    申请号：US17645200

    申请日：2021-12-20

    Applicant: Applied Materials, Inc.

    Inventor： Yangyang Sun ,  Jinxin Fu ,  Ludovic Godet

    IPC: G01B11/26

    CPC classification number: G01B11/26

    Abstract: Embodiments described herein provide for devices and methods of measuring a pitch P of optical device structures and an orientation angle ϕ of the optical device structures. One embodiment of the system includes an optical arm coupled to an arm actuator. The optical arm includes a light source. The light source emits a light path operable to be diffracted to the stage. The optical arm further includes a first beam splitter and a second beam splitter positioned in the light path. The first beam splitter directs the light path through a first lens and the second beam splitter directs the light path through a first dove prism and a second lens. The optical arm further includes a first detector operable to detect the light path from the first lens and second detector operable to detect the light path from the second lens.

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