公开(公告)号：US20030222019A1

公开(公告)日：2003-12-04

申请号：US10157626

申请日：2002-05-28

Applicant: Battelle Memorial Institute

Inventor： John L. Fulton ,  George Deverman

IPC: B01D011/04

CPC classification number: B05D1/025 ,  H01L51/0003 ,  H01L51/005 ,  Y10T428/25 ,  Y10T428/26

Abstract: A method for depositing a substance on a substrate that involves forming a supercritical fluid solution of at least one supercritical fluid solvent and at least one solute, discharging the supercritical fluid solution through an orifice under conditions sufficient to form solid particles of the solute that are substantially free of the supercritical fluid solvent, and electrostatically depositing the solid solute particles onto the substrate. The solid solute particles may be charged to a first electric potential and then deposited onto the substrate to form a film. The solute particles may have a mean particle size of less than 1 micron.

公开(公告)号：US20030222017A1

公开(公告)日：2003-12-04

申请号：US10156970

申请日：2002-05-28

Applicant: Battelle Memorial Institute

Inventor： John L. Fulton ,  George Deverman

IPC: B01D011/04

CPC classification number: B05D1/025 ,  B05D1/04

Abstract: A method for depositing a substance on a substrate that involves forming a supercritical fluid solution of at least one supercritical fluid solvent and at least one solute, discharging the supercritical fluid solution through an orifice under conditions sufficient to form solid particles of the solute that are substantially free of the supercritical fluid solvent, and electrostatically depositing the solid solute particles onto the substrate. The solid solute particles may be charged to a first electric potential and then deposited onto the substrate to form a film. The solute particles may have a mean particle size of less than 1 micron.

Abstract translation: 一种用于在基底上沉积物质的方法，其包括形成至少一种超临界流体溶剂和至少一种溶质的超临界流体溶液，在足以形成固体颗粒固体颗粒的条件下将超临界流体溶液排出孔口，该条件基本上 没有超临界流体溶剂，并将固体溶质颗粒静电沉积到基底上。 可以将固体溶质颗粒充电到第一电位，然后沉积到基底上以形成膜。 溶质颗粒可以具有小于1微米的平均粒度。

公开(公告)号：US20030222018A1

公开(公告)日：2003-12-04

申请号：US10157591

申请日：2002-05-28

Applicant: Battelle Memorial Institute

Inventor： Clement R. Yonker ,  John L. Fulton

IPC: B01D011/04

CPC classification number: B05D1/025 ,  B05D5/083

Abstract: A method for forming a continuous film on a substrate surface that involves depositing particles onto a substrate surface and contacting the particle-deposited substrate surface with a supercritical fluid under conditions sufficient for forming a continuous film from the deposited particles. The particles may have a mean particle size of less 1 micron. The method may be performed by providing a pressure vessel that can contain a compressible fluid. A particle-deposited substrate is provided in the pressure vessel and the compressible fluid is maintained at a supercritical or sub-critical state sufficient for forming a film from the deposited particles. The Tg of particles may be reduced by subjecting the particles to the methods detailed in the present disclosure.

Abstract translation: 一种用于在基板表面上形成连续膜的方法，其包括在足以从沉积颗粒形成连续膜的条件下将颗粒沉积到基板表面上并使颗粒沉积的基板表面与超临界流体接触。 颗粒可以具有小于1微米的平均粒度。 该方法可以通过提供可容纳可压缩流体的压力容器来进行。 在压力容器中提供颗粒沉积的基底，并且可压缩流体保持在足以从沉积的颗粒形成膜的超临界或亚临界状态。 颗粒的Tg可以通过使颗粒经受本公开中详述的方法来降低。