DIRECT PHOTOPATTERNING OF ROBUST AND DIVERSE MATERIALS
    1.
    发明申请
    DIRECT PHOTOPATTERNING OF ROBUST AND DIVERSE MATERIALS 审中-公开
    直接光电化的稳定和多样性材料

    公开(公告)号:US20150118188A1

    公开(公告)日:2015-04-30

    申请号:US14505824

    申请日:2014-10-03

    Abstract: The present invention relates to methods of metathesizing olefins using catalysts previously considered to be practically inactive. The present invention further relates to novel photosensitive compositions, their use as photoresists, and methods related to patterning polymer layers on substrates. Further, modifications to the compositions and method provide for an unprecedented functionalization of the compositions, useful for example in the preparation of sensors, drug delivery systems, and tissue scaffolds. The novel compositions and associated methods also provide for the opportunity to prepare 3-dimensional objects which provide new access to critically dimensioned devices, including for example photonic devices.

    Abstract translation: 本发明涉及使用先前被认为实际上无活性的催化剂使烯烃复分解的方法。 本发明还涉及新颖的光敏组合物,它们作为光致抗蚀剂的用途以及与在基底上图案化聚合物层有关的方法。 此外,组合物和方法的修改提供了组合物前所未有的功能化,例如在制备传感器,药物递送系统和组织支架中有用。 新颖的组合物和相关方法还提供了准备三维物体的机会,这些物体提供对接近尺寸的装置(包括例如光子器件)的新的接近。

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