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公开(公告)号：US20230322818A1
公开(公告)日：2023-10-12
申请号：US17768378
申请日：2020-10-21
Applicant: CENTRAL GLASS COMPANY, LIMITED
Inventor： Takashi MASUBUCHI , Yuri OIKAWA , Kazuhiro YAMANAKA
CPC classification number: C07F7/1892 , C08G77/24 , C08G77/80 , C08G77/08 , G03F7/0757 , G03F7/2004
Abstract: There is provided a silicon compound represented by General Formula (x). There is also provided a reactive material containing a silicon compound represented by General Formula (x). In General Formula (x), in a case where a plurality of R1's are present, R1's are each independently a linear alkyl group having 1 to 10 carbon atoms, a branched alkyl group having 3 to 10 carbon atoms, a cyclic alkyl group having 3 to 10 carbon atoms, a linear alkenyl group having 2 to 10 carbon atoms, a branched alkenyl group having 3 to 10 carbon atoms, or a cyclic alkenyl group having 3 to 10 carbon atoms, where all or part of hydrogen atoms in the alkyl group or the alkenyl group may be substituted with a fluorine atom, in a case where a plurality of R2's are present, R2's are each independently a linear alkyl group having 1 to 4 carbon atoms or a branched alkyl group having 3 or 4 carbon atoms, where all or part of hydrogen atoms in the alkyl group may be substituted with a fluorine atom, RA is an acid unstable group; a is an integer of 1 to 3, b is an integer of 0 to 2, and c is an integer of 1 to 3, where a+b+c=4 is satisfied; and n is an integer of 1 to 5.
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公开(公告)号：US20230333468A1
公开(公告)日：2023-10-19
申请号：US18334125
申请日：2023-06-13
Applicant: CENTRAL GLASS COMPANY, LIMITED
Inventor： Takashi MASUBUCHI , Yuri OIKAWA , Kazuhiro YAMANAKA
CPC classification number: G03F7/0043 , G03F7/0757 , G03F7/0048 , G03F7/094 , G03F7/0397 , G03F7/0045 , G03F7/2006 , G03F7/201
Abstract: An object is to provide a resin composition, which is a homogeneous solution containing a polymer, obtained by hydrolysis and polycondensation without precipitation during the sol-gel reaction even when a metal species with high EUV absorbance is introduced. The resin component includes a polymer including a constituent unit represented by (A) a following general formula (1) and (B) a following general formula (1-A),
[(R2)d(R3)e(OR4)fSiOg/2] (1)
[(R1)bMOc/2] (1-A)
In the general formula (1), R2 is a group represented by a following general formula (1a).-
Patent Agency Ranking
公开(公告)号：US20230244145A1
公开(公告)日：2023-08-03
申请号：US18184354
申请日：2023-03-15
Applicant: CENTRAL GLASS COMPANY, LIMITED
Inventor： Takashi MASUBUCHI , Tomohiro KATAMURA , Kazuhiro YAMANAKA
CPC classification number: G03F7/0757 , C08J3/247 , C08L83/06 , C08L2201/10 , C08L2203/16 , C08L2203/206
Abstract: A polysiloxane that has a fast polymerization reaction rate and good storage stability is provided. Alternatively, a silicon-containing monomer mixture as a raw material of the polysiloxane, a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane are provided. Alternatively, the present invention provides a production method for a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane. A mixture is provided including a first monomer containing silicon represented by the following general formula (X); and a second monomer containing silicon represented by the following general formula (Y). In the case where A is set to a contained amount of the first monomer containing silicon and B is set to a contained amount of the second monomer containing silicon, the following relationship is satisfied.
B
/
A + B
>
0
.04-
公开(公告)号：US20230039535A1
公开(公告)日：2023-02-09
申请号：US17944817
申请日：2022-09-14
Applicant: CENTRAL GLASS COMPANY, LIMITED
Inventor： Yuri OIKAWA , Takashi MASUBUCHI , Kazuhiro YAMANAKA
IPC: G03F7/11 , C08G77/24 , C09D183/08
Abstract: A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B). [(R1)b(R2)m(OR3)lSiOn/2] (1) [In the formula, R1 is a group represented by following formula.] [(R4)pSiOq/2] (2)
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公开(公告)号：US20230408922A1
公开(公告)日：2023-12-21
申请号：US18334118
申请日：2023-06-13
Applicant: CENTRAL GLASS COMPANY, LIMITED
Inventor： Yuri OIKAWA , Takashi MASUBUCHI , Kazuhiro YAMANAKA , Rikako YOTSUMOTO
CPC classification number: G03F7/0757 , C08G77/24 , C08K3/22 , C08K3/36 , C08K2003/2241 , C08K2003/2244
Abstract: An application liquid for an optical member comprises a component (A) consisting of metal fine particles (A-1) and/or a metal compound (A-2) including a constituent unit represented by the following general formula (1-A), a stabilizer (B) consisting of a polysiloxane compound including a constituent unit represented by the following general formula (1); and a solvent (C),
[(R1)bMOc/2] (1-A)
[(R2)d(R3)e(OR4)fSiOg/2] (1)-
公开(公告)号：US20230037301A1
公开(公告)日：2023-02-09
申请号：US17945742
申请日：2022-09-15
Applicant: CENTRAL GLASS COMPANY, LIMITED
Inventor： Takashi MASUBUCHI , Yuri OIKAWA , Kazuhiro YAMANAKA , Rikako YOTSUMOTO
Abstract: A new photosensitive resin composition based on a polysiloxane, that is, a negative photosensitive resin composition is provided. A negative photosensitive resin composition includes (A) a polysiloxane compound containing a first structural unit represented by the following general formula (1), (B) a photoinduced curing accelerator, and (C) a solvent. [(Rx)bR1mSiOn/2] (1)
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公开(公告)号：US20210395461A1
公开(公告)日：2021-12-23
申请号：US17289471
申请日：2019-10-28
Applicant: CENTRAL GLASS COMPANY, LIMITED
Inventor： Yutaka SUGITA , Tomohiro KATAMURA , Junya NAKATSUJI , Kazuhiro YAMANAKA , Takashi MASUBUCHI
Abstract: Provided is a polysiloxane composition containing a polysiloxane compound including a constitutional unit represented by Formula (1) and at least one of a constitutional unit of Formula (2) and a constitutional unit of Formula (3), and a solvent. [(Rx)bR1mSiOn/2] (1) [(Ry)cR2pSiOq/2] (2) [SiO4/2] (3) Here, Rx is a monovalent group represented by Formula (1a) (X is a hydrogen atom or an acid-labile group, a is an integer of 1 to 5, and a broken line represents a bond), Ry is a monovalent organic group having 1 to 30 carbon atoms, which contains any one of an epoxy group, an oxetane group, an acryloyl group, and a methacryloyl group.
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