公开(公告)号：US20180326433A1

公开(公告)日：2018-11-15

申请号：US15775779

申请日：2016-11-10

Applicant: CORNELL UNIVERSITY

Inventor： Yong Lak JOO ,  Yevgen ZHMAYEV

IPC: B05B5/03 ,  B05D1/06 ,  C09D129/04 ,  C09D7/61 ,  C09D7/40 ,  C09D7/20

CPC classification number: B05B5/03 ,  B05D1/06 ,  C08L101/00 ,  C09D7/20 ,  C09D7/61 ,  C09D7/67 ,  C09D129/04

Abstract: Provided in certain embodiments herein are alternating current electrospray systems and processes for manufacturing depositions, such as thin layer depositions. In some embodiments, processes and systems provided herein are suitable for and configured to manufacture uniform depositions, such as having uniform thickness.

公开(公告)号：US20180369839A1

公开(公告)日：2018-12-27

申请号：US15775732

申请日：2016-11-10

Applicant: Cornell University

Inventor： Yong Lak JOO ,  Yevgen ZHMAYEV

IPC: B05B5/03 ,  B05D1/06 ,  B05D5/08

Abstract: Provided in certain embodiments herein are gas controlled electrospray systems and processes for manufacturing depositions, such as thin layer films. In some embodiments, processes and systems provided herein are suitable for and configured to manufacture uniform depositions, such as having uniform thickness.