公开(公告)号：US08872122B2

公开(公告)日：2014-10-28

申请号：US13738918

申请日：2013-01-10

Applicant: Cymer, Inc.

Inventor： Alexander Schafgans ,  James Crouch ,  Matthew R. Graham ,  Steven Chang ,  Paul Frihauf ,  Andrew Liu ,  Wayne Dunstan

IPC: G01J1/42 ,  G21K5/00

CPC classification number: G21K5/00 ,  H05G2/003 ,  H05G2/008

Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.

Abstract translation: 这里描述了通过调整激光激光束脉冲的定时来控制从激光产生的等离子体极紫外光系统输出能量的方法的实施例。 在频闪发射期间，脉冲被定时以液滴滴定，直到达到EUV的剂量目标。 一旦累积的EUV达到剂量目标，脉冲被定时，以便在分组的剩余部分期间不会液滴，从而防止在分组的那些部分期间产生额外的EUV光。 在连续脉冲串模式中，脉冲被定时以照射液滴，直到累积脉冲串错误达到或超过阈值脉冲串错误。 如果累积突发错误满足或超过阈值突发错误，则下一个脉冲被定时以不照射下一个液滴。 因此，本文所述的实施例操纵脉冲定时以获得可以更精确地匹配下游计量要求的恒定的期望剂量目标。

公开(公告)号：US20140191132A1

公开(公告)日：2014-07-10

申请号：US13738918

申请日：2013-01-10

Applicant: CYMER, INC.

Inventor： Alexander Schafgans ,  James Crouch ,  Matthew R. Graham ,  Steven Chang ,  Paul Frihauf ,  Andrew Liu ,  Wayne Dunstan

IPC: G21K5/00

CPC classification number: G21K5/00 ,  H05G2/003 ,  H05G2/008

Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.

Abstract translation: 这里描述了通过调整激光激光束脉冲的定时来控制从激光产生的等离子体极紫外光系统输出能量的方法的实施例。 在频闪发射期间，脉冲被定时以液滴滴定，直到达到EUV的剂量目标。 一旦累积的EUV达到剂量目标，脉冲被定时，以便在分组的其余部分期间不会液滴，从而防止在分组的那些部分期间产生额外的EUV光。 在连续脉冲串模式中，脉冲被定时以照射液滴，直到累积脉冲串错误达到或超过阈值脉冲串错误。 如果累积突发错误满足或超过阈值突发错误，则下一个脉冲被定时以不照射下一个液滴。 因此，本文所述的实施例操纵脉冲定时以获得可以更精确地匹配下游计量要求的恒定的期望剂量目标。

公开(公告)号：US08872123B2

公开(公告)日：2014-10-28

申请号：US13738923

申请日：2013-01-10

Applicant: Cymer, Inc.

Inventor： James Crouch ,  Robert Jacques ,  Matthew R. Graham ,  Andrew Liu

IPC: G01J1/42 ,  G21K5/00

CPC classification number: G21K5/00 ,  H05G2/003 ,  H05G2/008

Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.

公开(公告)号：US09000403B2

公开(公告)日：2015-04-07

申请号：US13768588

申请日：2013-02-15

Applicant: Cymer, Inc.

Inventor： James Crouch ,  Matthew Graham ,  Robert J. Rafac ,  Daniel Jason Riggs

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/003

Abstract: A method and apparatus for controlling the seed laser in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system are disclosed. In one embodiment, a seed laser generates both pre-pulses and main pulses which are amplified and irradiate a target material. The widths of the main pulses are adjusted, for example by the use of an EOM or other optical switch, without adjusting the widths of the pre-pulses, to keep the EUV output energy at a desired level. Only if the main pulse widths are longer or shorter than a desired range is the duty cycle of the laser amplifier adjusted, to keep the main pulse widths in the desired range. Adjusting the main pulse widths in this way before adjusting the pump RF duty cycle allows for less adjustment of the duty cycle, thus causing less adjustment to the pre-pulses.

Abstract translation: 公开了一种用于在激光产生的等离子体（LPP）极紫外（EUV）光系统中控制种子激光的方法和装置。 在一个实施例中，种子激光器产生放大并照射目标材料的预脉冲和主脉冲。 主脉冲的宽度例如通过使用EOM或其他光开关来调节，而不调节预脉冲的宽度，以将EUV输出能量保持在期望的水平。 只有当主脉冲宽度长于或短于期望范围时，调整激光放大器的占空比，才能将主脉冲宽度保持在所需范围内。 在调节泵的RF占空比之前，以这种方式调整主脉冲宽度可以减少占空比的调整，从而对预脉冲进行较少的调整。

公开(公告)号：US20140233005A1

公开(公告)日：2014-08-21

申请号：US13768588

申请日：2013-02-15

Applicant: CYMER, INC.

Inventor： James Crouch ,  Matthew Graham ,  Robert J. Rafac

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/003

Abstract: A method and apparatus for controlling the seed laser in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system are disclosed. In one embodiment, a seed laser generates both pre-pulses and main pulses which are amplified and irradiate a target material. The widths of the main pulses are adjusted, for example by the use of an EOM or other optical switch, without adjusting the widths of the pre-pulses, to keep the EUV output energy at a desired level. Only if the main pulse widths are longer or shorter than a desired range is the duty cycle of the laser amplifier adjusted, to keep the main pulse widths in the desired range. Adjusting the main pulse widths in this way before adjusting the pump RF duty cycle allows for less adjustment of the duty cycle, thus causing less adjustment to the pre-pulses.

Abstract translation: 公开了一种用于在激光产生的等离子体（LPP）极紫外（EUV）光系统中控制种子激光的方法和装置。 在一个实施例中，种子激光器产生放大并照射目标材料的预脉冲和主脉冲。 主脉冲的宽度例如通过使用EOM或其他光开关来调节，而不调节预脉冲的宽度，以将EUV输出能量保持在期望的水平。 只有当主脉冲宽度长于或短于期望范围时，调整激光放大器的占空比，才能将主脉冲宽度保持在所需范围内。 在调节泵的RF占空比之前，以这种方式调整主脉冲宽度可以减少占空比的调整，从而对预脉冲进行较少的调整。

公开(公告)号：US20140191133A1

公开(公告)日：2014-07-10

申请号：US13738923

申请日：2013-01-10

Applicant: CYMER, INC.

Inventor： James Crouch ,  Robert Jacques ,  Matthew R. Graham ,  Andrew Liu

IPC: G21K5/00

CPC classification number: G21K5/00 ,  H05G2/003 ,  H05G2/008

Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.