公开(公告)号：US20140102881A1

公开(公告)日：2014-04-17

申请号：US13650778

申请日：2012-10-12

Applicant: CYMER INC.

Inventor： Alexander I. ERSHOV

IPC: B44C1/22 ,  B32B43/00

CPC classification number: G03F7/70925 ,  G03F7/70216 ,  G03F7/70975

Abstract: Method of and apparatus for repairing an optical element disposed in a vacuum chamber while the optical element is in the vacuum chamber. An exposed surface of the optical element is exposed to an ion flux generated by an ion source to remove at least some areas of the surface that have been damaged by exposure to the environment within the vacuum chamber. The method and apparatus are especially applicable to repair multilayer mirrors serving as collectors in systems for generating EUV light for use in semiconductor photolithography.

Abstract translation: 在光学元件位于真空室中时修复设置在真空室中的光学元件的方法和装置。 光学元件的暴露表面暴露于由离子源产生的离子通量，以去除通过暴露于真空室内的环境而损坏的表面的至少一些区域。 该方法和装置特别适用于在用于生成用于半导体光刻中的EUV光的系统中用作收集器的多层反射镜。

公开(公告)号：US20140098413A1

公开(公告)日：2014-04-10

申请号：US13645253

申请日：2012-10-04

Applicant: CYMER INC.

Inventor： Alexander I. ERSHOV ,  Norbert R. Bowering ,  Bruno M. La Fontaine ,  Silvia De Dea

IPC: G02B5/08

CPC classification number: G03F7/70958 ,  G02B5/0891 ,  G03F7/70983

Abstract: Optical element protection systems for protecting optical elements and particularly reflective optical elements from degradation of their optical properties in harsh environments such as the environment inside a vacuum chamber of an EUV light source. The systems include the uses of combinations of materials in various layers where the materials are chosen and the layers are configured and arranged to extend the lifetime of the optical element without compromising its optical properties.

Abstract translation: 用于保护光学元件，特别是反射光学元件的光学元件保护系统免受其在恶劣环境（例如EUV光源的真空室内的环境）下的光学性能的劣化。 这些系统包括在各种层中的材料的组合的使用，其中材料被选择并且层被配置和布置以延长光学元件的寿命而不损害其光学性质。