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公开(公告)号：US10185234B2
公开(公告)日：2019-01-22
申请号：US13645253
申请日：2012-10-04
Applicant: Cymer Inc.
Inventor： Alexander I. Ershov , Norbert R. Bowering , Bruno M. La Fontaine , Silvia De Dea
Abstract: Optical element protection systems for protecting optical elements and particularly reflective optical elements from degradation of their optical properties in harsh environments such as the environment inside a vacuum chamber of an EUV light source. The systems include the uses of combinations of materials in various layers where the materials are chosen and the layers are configured and arranged to extend the lifetime of the optical element without compromising its optical properties.
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公开(公告)号：US20140203195A1
公开(公告)日：2014-07-24
申请号：US13747263
申请日：2013-01-22
Applicant: CYMER, INC.
Inventor： Vladimir Fleurov , Igor Fomenkov , Shailendra Srivastava
IPC: H05G2/00
Abstract: A first temperature distribution that represents a temperature of an element adjacent to and distinct from a first optical element that is positioned to receive an amplified light beam is accessed. The accessed first temperature distribution is analyzed to determine a temperature metric associated with the element, the determined temperature metric is compared to a baseline temperature metric, and an adjustment to position of the amplified light beam relative to the first optical element is determined based on the comparison.
Abstract translation: 访问表示与位于接收放大光束的第一光学元件相邻且不同的元件的温度的第一温度分布。 分析访问的第一温度分布以确定与元件相关联的温度度量，将确定的温度度量与基线温度度量进行比较，并且基于放大光束相对于第一光学元件的位置的调整，基于 比较。
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公开(公告)号：US20140098413A1
公开(公告)日：2014-04-10
申请号：US13645253
申请日：2012-10-04
Applicant: CYMER INC.
Inventor： Alexander I. ERSHOV , Norbert R. Bowering , Bruno M. La Fontaine , Silvia De Dea
IPC: G02B5/08
CPC classification number: G03F7/70958 , G02B5/0891 , G03F7/70983
Abstract: Optical element protection systems for protecting optical elements and particularly reflective optical elements from degradation of their optical properties in harsh environments such as the environment inside a vacuum chamber of an EUV light source. The systems include the uses of combinations of materials in various layers where the materials are chosen and the layers are configured and arranged to extend the lifetime of the optical element without compromising its optical properties.
Abstract translation: 用于保护光学元件，特别是反射光学元件的光学元件保护系统免受其在恶劣环境（例如EUV光源的真空室内的环境）下的光学性能的劣化。 这些系统包括在各种层中的材料的组合的使用，其中材料被选择并且层被配置和布置以延长光学元件的寿命而不损害其光学性质。
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4.发明授权EUV light source components and methods for producing, using and refurbishing same 有权EUV光源组件及其制造，使用和翻新方法公开(公告)号：US08686370B2
公开(公告)日：2014-04-01
申请号：US13675972
申请日：2012-11-13
Applicant: Cymer, Inc.
Inventor： Norbert R. Bowering , Oleh V. Khodykin
IPC: G01J1/00
CPC classification number: G02B5/0891 , B82Y10/00 , G01J1/429 , G03F7/70941 , G03F7/70958 , G03F7/70975 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.
Abstract translation: 公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。 该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和 镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。 还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料 技术，并沉积覆盖中间材料的多层镜面涂层。
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Patent Agency Ranking
公开(公告)号：US08791440B1
公开(公告)日：2014-07-29
申请号：US13830380
申请日：2013-03-14
Applicant: Cymer, Inc.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J. W. Brown , Daniel J. Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。
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7.发明申请Method of Timing Laser Beam Pulses to Regulate Extreme Ultraviolet Light Dosing 有权激光束脉冲定时调节极紫外光量的方法公开(公告)号：US20140191132A1
公开(公告)日：2014-07-10
申请号：US13738918
申请日：2013-01-10
Applicant: CYMER, INC.
Inventor： Alexander Schafgans , James Crouch , Matthew R. Graham , Steven Chang , Paul Frihauf , Andrew Liu , Wayne Dunstan
IPC: G21K5/00
Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.
Abstract translation: 这里描述了通过调整激光激光束脉冲的定时来控制从激光产生的等离子体极紫外光系统输出能量的方法的实施例。 在频闪发射期间，脉冲被定时以液滴滴定，直到达到EUV的剂量目标。 一旦累积的EUV达到剂量目标，脉冲被定时，以便在分组的其余部分期间不会液滴，从而防止在分组的那些部分期间产生额外的EUV光。 在连续脉冲串模式中，脉冲被定时以照射液滴，直到累积脉冲串错误达到或超过阈值脉冲串错误。 如果累积突发错误满足或超过阈值突发错误，则下一个脉冲被定时以不照射下一个液滴。 因此，本文所述的实施例操纵脉冲定时以获得可以更精确地匹配下游计量要求的恒定的期望剂量目标。
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公开(公告)号：US20140102881A1
公开(公告)日：2014-04-17
申请号：US13650778
申请日：2012-10-12
Applicant: CYMER INC.
Inventor： Alexander I. ERSHOV
CPC classification number: G03F7/70925 , G03F7/70216 , G03F7/70975
Abstract: Method of and apparatus for repairing an optical element disposed in a vacuum chamber while the optical element is in the vacuum chamber. An exposed surface of the optical element is exposed to an ion flux generated by an ion source to remove at least some areas of the surface that have been damaged by exposure to the environment within the vacuum chamber. The method and apparatus are especially applicable to repair multilayer mirrors serving as collectors in systems for generating EUV light for use in semiconductor photolithography.
Abstract translation: 在光学元件位于真空室中时修复设置在真空室中的光学元件的方法和装置。 光学元件的暴露表面暴露于由离子源产生的离子通量，以去除通过暴露于真空室内的环境而损坏的表面的至少一些区域。 该方法和装置特别适用于在用于生成用于半导体光刻中的EUV光的系统中用作收集器的多层反射镜。
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公开(公告)号：US08653492B1
公开(公告)日：2014-02-18
申请号：US13830461
申请日：2013-03-14
Applicant: Cymer, Inc.
Inventor： Robert J. Rafac , Yezheng Tao
IPC: H05G2/00
CPC classification number: H05G2/008 , G03F7/70033 , G21K5/00 , H05G2/005
Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
Abstract translation: 用于产生EUV光的技术包括将第一辐射脉冲引导到目标材料液滴以形成修改的液滴，所述第一辐射脉冲具有足以改变目标材料液滴形状的能量; 将第二脉冲的辐射引向修饰的液滴以形成吸收材料，第二脉冲的辐射具有足以改变改性液滴的性质的能量，该性质与辐射的吸收有关; 并且将放大的光束引向吸收材料，放大的光束具有足以将吸收材料的至少一部分转化成极紫外（EUV）光的能量。
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公开(公告)号：US20040057474A1
公开(公告)日：2004-03-25
申请号：US10670406
申请日：2003-09-24
Applicant: Cymer, Inc.
Inventor： Igor V. Fomenkov , Armen Kroyan , Jesse D. Buck , Palash P. Das , Richard L. Sandstrom , Frederick G. Erie , John Martin Algots , Gamaralalage G. Padmabandu
IPC: H01S003/10
CPC classification number: G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/22 , H01S3/2207 , H01S3/225
Abstract: A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.
Abstract translation: 一种用于放电激光器带宽控制的技术。 提供线窄设备具有至少一个压电驱动器和快速带宽检测装置以及具有小于约1.0毫秒的时间响应的带宽控制。 在优选实施例中，波长调谐镜在非常窄的转角范围内以每秒超过500次抖动的抖动速率抖动，以使标称波长值的抖动产生期望的一系列激光脉冲的有效带宽。
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