公开(公告)号：US20140107959A1

公开(公告)日：2014-04-17

申请号：US14134236

申请日：2013-12-19

Applicant: EBARA CORPORATION

Inventor： Toshifumi KIMBA ,  Keisuke MIZUUCHI

IPC: H01J37/304 ,  G01N23/00

CPC classification number: H01J37/3045 ,  G01N23/00 ,  H01J37/28 ,  H01J2237/2817 ,  H01L21/681

Abstract: An electron beam apparatus for inspecting a pattern on a sample using multiple electron beams includes a plurality of primary electro-optical systems and a plurality of secondary electro-optical systems associated with the respective primary electro-optical systems. The primary electro-optical systems are for irradiating multiple primary electron beams on a surface of the sample, and each includes an electron gun having an anode and an objective lens. The secondary electro-optical systems are for inducing secondary electrons emitted from a surface of the sample by irradiation of the primary electron beams. Detectors are each for detecting the secondary electrons and generating electric signals corresponding to the detected electrons. The anodes of the electron guns of the primary electro-optical systems comprise an anode substrate in common having multiple holes corresponding to the axes of the respective primary electro-optical systems. The anode substrate has metal coatings around the respective holes.

Abstract translation: 用于使用多个电子束检查样品上的图案的电子束装置包括多个初级电光系统和与各个主电光系统相关联的多个次电光系统。 初级电光系统用于在样品的表面上照射多个一次电子束，并且每个包括具有阳极和物镜的电子枪。 次级电光系统用于通过照射一次电子束来诱导从样品表面发射的二次电子。 检测器各自用于检测二次电子并产生对应于检测到的电子的电信号。 初级电光学系统的电子枪的阳极包括共同的具有对应于各个主要电光学系统的轴的多个孔的阳极衬底。 阳极基板具有围绕相应孔的金属涂层。