公开(公告)号：US20250073851A1

公开(公告)日：2025-03-06

申请号：US18813172

申请日：2024-08-23

Applicant: EBARA CORPORATION

Inventor： Matsutaro MIYAMOTO

IPC: B24B53/017 ,  B24B37/04

Abstract: A free joint structure capable of absorbing a misalignment between a piston rod and a shaft is disclosed. The free joint structure includes a push-pull force generating portion and a target load portion.

公开(公告)号：US20250128380A1

公开(公告)日：2025-04-24

申请号：US18923685

申请日：2024-10-23

Applicant: EBARA CORPORATION

Inventor： Matsutaro MIYAMOTO

IPC: B24B53/017 ,  B24B37/34

Abstract: A technology that can clean a bottom surface of a dresser while inhibiting a cleaning solution discharged from a cleaning nozzle from splashing in a direction of a polishing pad. A polishing apparatus 1 includes a polishing table 2, a top ring 3, a dresser 10, at least one cleaning nozzle 20, and a dresser rotation mechanism 32. The at least one cleaning nozzle discharges a cleaning solution Lq in a fan shape and in a direction away from a polishing pad Pd, and an intersection point IP where a discharge central axis XL2 of the cleaning solution intersects with a bottom surface 11 of the dresser is positioned closer to the at least one cleaning nozzle than a center line CL1 of the bottom surface of the dresser. The at least one cleaning nozzle discharges the cleaning solution such that a part of the cleaning solution discharged from the cleaning nozzle and contacting the bottom surface of the dresser moves and passes through the center C1 of the bottom surface of the dresser.

公开(公告)号：US20180155847A1

公开(公告)日：2018-06-07

申请号：US15824192

申请日：2017-11-28

Applicant: EBARA CORPORATION

Inventor： Matsutaro MIYAMOTO ,  Jumpei FUJIKATA ,  Kiyoshi SUZUKI

IPC: C25D17/06

Abstract: Provided is a substrate holder where an effect of a pressure of a plating solution can be suppressed. A substrate holder includes first and second holding members for sandwiching a substrate. The first holding member includes: a support base; a movable base for supporting the substrate; and a biasing mechanism disposed between the support base and the movable base, and biasing the movable base in a direction along which the movable base is separated from the support base. The second holding member includes a protruding portion brought into contact with the substrate so as to seal the substrate. A biasing force of the biasing mechanism which is applied to a region or a position of the movable base differs from a biasing force of the biasing mechanism which is applied to another region or at another position of the movable base.

公开(公告)号：US20200161164A1

公开(公告)日：2020-05-21

申请号：US16680451

申请日：2019-11-11

Applicant: EBARA CORPORATION

Inventor： Matsutaro MIYAMOTO

IPC: H01L21/687 ,  C25D17/06

Abstract: A substrate holder capable of being used in both single-side plating and double-side plating is required. Disclosed is a substrate holder for holding a substrate to be plated. The substrate holder includes a first frame having a first opening for exposing one surface of the substrate and a second frame having a second opening for exposing the other surface of the substrate, and the substrate is sandwiched between the first frame and the second frame. The substrate holder further includes a dummy substrate which is detachably disposed between the first frame and the substrate and formed of a material that at least direct current does not substantially flow therein. At least a part of the dummy substrate is in contact with at least a part of the one surface of the substrate, and the dummy substrate protects the one surface of the substrate from a plating solution.

公开(公告)号：US20170321343A1

公开(公告)日：2017-11-09

申请号：US15589888

申请日：2017-05-08

Applicant: EBARA CORPORATION

Inventor： Matsutaro MIYAMOTO

IPC: C25D17/00 ,  C25D17/08 ,  H01L21/288 ,  H01L21/683 ,  C25D17/06 ,  C25D7/12

Abstract: To provide a substrate holder having a new positioning structure, which does not use a plate spring, and a plating apparatus using this substrate holder. A substrate holder is provided. This substrate holder has a first holding member having a first surface configured to contact with a substrate, and a second holding member for sandwiching and holding the substrate together with the first holding member. The first holding member has a positioning member for positioning the substrate in contact with the first surface at a prescribed position of the first surface. The positioning member is configured to move between a first position where the substrate is to be positioned at the prescribed position of the first surface, in contact with a peripheral edge part of the substrate, and a second position not in contact with the substrate. The second holding member has a driving member configured to cause the positioning member to be positioned at the first position, at the time when holding the substrate by the first holding member and the second holding member.

公开(公告)号：US20230268209A1

公开(公告)日：2023-08-24

申请号：US18141739

申请日：2023-05-01

Applicant: EBARA CORPORATION

Inventor： Matsutaro MIYAMOTO

IPC: H01L21/673 ,  C25D17/06 ,  H01L21/687 ,  C25D17/00

CPC classification number: H01L21/673 ,  C25D17/06 ,  H01L21/68785 ,  H01L21/68721 ,  C25D17/001

Abstract: One object of this application is to provide an advanced substrate holder including a clamper. A substrate holder for holding a substrate by interposing the substrate between frames is disclosed. The substrate holder includes a front frame, a rear frame, and one or a plurality of clampers. Each of the clampers includes a hook portion including a hook base and a hook main body, and a plate including at least one claw. At least one of the clampers includes the plate including a first claw for a lock and a second claw for a semi-lock.

公开(公告)号：US20180016698A1

公开(公告)日：2018-01-18

申请号：US15645530

申请日：2017-07-10

Applicant: EBARA CORPORATION

Inventor： Matsutaro MIYAMOTO

IPC: C25D17/06 ,  C25D17/00 ,  C25D7/12

Abstract: A substrate holder has a first holding member having a first surface configured to contact with a substrate, and a second holding member for sandwiching and holding the substrate together with the first holding member. The first holding member has a positioning member for positioning the substrate in contact with the first surface at a prescribed position of the first surface. The positioning member is configured to move between a first position where the substrate is to be positioned at the prescribed position of the first surface, in contact with a peripheral edge part of the substrate, and a second position not in contact with the substrate. The second holding member has a driving member configured to cause the positioning member to be positioned at the first position, at the time when holding the substrate by the first holding member and the second holding member.

公开(公告)号：US20140291980A1

公开(公告)日：2014-10-02

申请号：US14228404

申请日：2014-03-28

Applicant: EBARA CORPORATION

Inventor： Matsutaro MIYAMOTO

IPC: F16L27/10

CPC classification number: F04D29/605 ,  F04D19/042 ,  Y10T29/49826

Abstract: A vacuum pump connecting apparatus has a first vibration absorbing portion and a second vibration absorbing portion which are connected to an evacuation connection portion so as to dispose the first vibration absorbing portion and the second vibration absorbing portion opposite each other via the evacuation connection portion. The first vibration absorbing portion is connected to an intake port of a vacuum pump at a second end of the first vibration absorbing portion opposite to a first end of the first vibration absorbing portion connected to the evacuation connection portion. The first vibration absorbing portion and the second vibration absorbing portion are elastic bellows. A vacuum pump connecting apparatus has a rigid coupling member is connected to a second end of the second vibration absorbing portion opposite to a first end of the second vibration absorbing portion connected to the evacuation connection portion.

Abstract translation: 真空泵连接装置具有第一吸振部和第二振动吸收部，该第一振动吸收部和第二振动吸收部与排气连接部连接，以将第一振动吸收部和第二振动吸收部经由排气连接部相对。 第一振动吸收部在第一吸振部的第二端与真空泵的吸入口连接，与第一吸振部的连接于抽空连接部的第一端相反。 第一振动吸收部分和第二振动吸收部分是弹性波纹管。 真空泵连接装置具有刚性联接构件，其与第二吸振部的与抽真空连接部连接的第二振动吸收部的第一端相对的第二端连接。

公开(公告)号：US20210277534A1

公开(公告)日：2021-09-09

申请号：US16330717

申请日：2017-09-07

Applicant: EBARA CORPORATION

Inventor： Matsutaro MIYAMOTO ,  Yoshitaka MUKAIYAMA

IPC: C25D17/06 ,  H01L21/687

Abstract: Provided is a substrate holder including a first holding member and a second holding member configured to sandwich and fix a substrate, wherein the first holding member includes a first holding member body, and a clamp provided on the first holding member body, the clamp being rotatable about a shaft extending parallel to a surface of the first holding member body, or being reciprocable in a direction intersecting with the surface of the first holding member body, the second holding member includes a second holding member body, and the clamp is capable of engaging with the second holding member in a state where the first holding member body and the second holding member body are brought into contact with each other, to fix the second holding member to the first holding member.

公开(公告)号：US20200006090A1

公开(公告)日：2020-01-02

申请号：US16401841

申请日：2019-05-02

Applicant: EBARA CORPORATION

Inventor： Matsutaro MIYAMOTO

IPC: H01L21/673 ,  C25D17/06 ,  C25D17/00 ,  H01L21/687

Abstract: One object of this application is to provide an advanced substrate holder including a clamper. A substrate holder for holding a substrate by interposing the substrate between frames is disclosed. The substrate holder includes a front frame, a rear frame, and one or a plurality of clampers. Each of the clampers includes a hook portion including a hook base and a hook main body, and a plate including at least one claw. At least one of the clampers includes the plate including a first claw for a lock and a second claw for a semi-lock.