公开(公告)号：US20140273753A1

公开(公告)日：2014-09-18

申请号：US14203494

申请日：2014-03-10

Applicant: EBARA CORPORATION

Inventor： Hisanori MATSUO ,  Yoshihiro MOCHIZUKI ,  Chikako TAKATOH ,  Tadashi OBO

IPC: B24B37/005 ,  B24B49/12 ,  B24B57/02 ,  B24B37/04

CPC classification number: B24B37/005 ,  B24B49/12 ,  B24B57/02

Abstract: A polishing apparatus polishes a surface of a substrate by pressing the substrate against a polishing pad on a polishing table. The polishing apparatus includes a polishing liquid supply nozzle for supplying a polishing liquid onto the polishing pad, a polishing liquid storage mechanism disposed on the polishing pad for storing the polishing liquid on the polishing pad by damming the polishing liquid, and a polishing liquid sensor for measuring a physical quantity representing the freshness of the polishing liquid stored by the polishing liquid storage mechanism. The polishing apparatus further includes a freshness measuring instrument for calculating the freshness of the stored polishing liquid from the physical quantity measured by the polishing liquid sensor, and a freshness controller for controlling supply conditions of the polishing liquid or storage state of the polishing liquid, based on the freshness of the polishing liquid that is determined by the freshness measuring instrument.

Abstract translation: 抛光装置通过将基板压靠在研磨台上的抛光垫上来抛光基板的表面。 抛光装置包括：抛光液供给喷嘴，用于将抛光液体提供到抛光垫上;抛光液体存储机构，设置在抛光垫上，用于通过阻止抛光液将抛光液储存在抛光垫上;抛光液体传感器， 测量表示由研磨液储存机构储存的研磨液的新鲜度的物理量。 抛光装置还包括：新鲜度测量装置，用于根据由抛光液体传感器测量的物理量计算储存的抛光液的新鲜度;以及新鲜度控制器，用于控制抛光液的供应条件或抛光液的储存状态 在由新鲜度测量仪器确定的抛光液的新鲜度上。

公开(公告)号：US20150346088A1

公开(公告)日：2015-12-03

申请号：US14725322

申请日：2015-05-29

Applicant: EBARA CORPORATION

Inventor： Chikako TAKATOH ,  Yumiko NAKAMURA ,  Tadashi OBO ,  Hisanori MATSUO

IPC: G01N21/33 ,  G01N27/26 ,  B24B49/12 ,  G01N30/74 ,  B24B37/005

CPC classification number: G01N21/33 ,  B24B37/0056 ,  B24B49/12 ,  G01N21/31 ,  G01N2021/3155 ,  G01N2030/8809

Abstract: A method for judging polishing performance of a polishing liquid, which can judge freshness of a slurry by measuring a component concentration or a physical quantity corresponding to the component concentration of the slurry after polishing and by evaluating an accelerator component and an inhibitor component of the slurry is disclosed. The polishing performance judging method of a polishing liquid judges polishing performance of a polishing liquid containing an accelerator for promoting dissolution of an object to be polished and an inhibitor for inhibiting dissolution of the object to be polished. The method includes analyzing a polishing waste liquid by spectroscopy, selecting a plurality of wavelengths from wavelengths which can distinguish the accelerator, the inhibitor, and a complex compound of the accelerator and a metal to be polished, and measuring absorbance at the selected plurality of wavelengths to thereby judge the polishing performance of the polishing liquid.

Abstract translation: 一种用于判断研磨液的抛光性能的方法，其可以通过测量与研磨后的浆料的成分浓度相对应的成分浓度或物理量，并通过评价浆料的促进剂成分和抑制剂成分来判断浆料的新鲜度 被披露。 抛光液的抛光性能判断方法判断含有促进被研磨物的溶解的促进剂的研磨液的研磨性能和抑制被研磨物的溶解的抑制剂。 该方法包括通过光谱法分析抛光废液，从可区分加速剂，抑制剂和加速剂与待抛光金属的复合化合物的波长选择多个波长，并测量所选择的多个波长处的吸光度 从而判断研磨液的研磨性能。