Plasma generating device
    1.
    发明授权
    Plasma generating device 有权
    等离子体发生装置

    公开(公告)号:US09576775B2

    公开(公告)日:2017-02-21

    申请号:US14532894

    申请日:2014-11-04

    CPC classification number: H01J37/32449 H01J37/32899 H05H1/36 H05H1/44

    Abstract: The invention relates to a plasma generation device comprising a plurality of plasma modules for generating a plasma. Each plasma module has a module housing with at least one gas inlet for supplying a process gas. Furthermore, a discharge device for generating the plasma from the process gas and a plasma outlet are provided. The plasma generation device has at least two plasma modules for generating a plasma. Each plasma module has at least one gas outlet for some of the process gas, wherein the at least one gas outlet of at least one plasma module issues into a respective gas inlet of another plasma module.

    Abstract translation: 本发明涉及一种等离子体产生装置,其包括用于产生等离子体的多个等离子体模块。 每个等离子体模块具有模块壳体,其具有至少一个气体入口用于提供处理气体。 此外,提供了用于从处理气体产生等离子体的排出装置和等离子体出口。 等离子体产生装置具有用于产生等离子体的至少两个等离子体模块。 每个等离子体模块具有用于一些工艺气体的至少一个气体出口,其中至少一个等离子体模块的至少一个气体出口发射到另一个等离子体模块的相应气体入口。

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