公开(公告)号：US09636626B2

公开(公告)日：2017-05-02

申请号：US14746776

申请日：2015-06-22

Applicant: Entegris, Inc. ,  Judith A. Moroco

Inventor： Dennis Brestovansky ,  Michael J. Wodjenski ,  Jose I. Arno ,  J. Donald Carruthers ,  Philip A. Moroco

IPC: B01D53/04 ,  F17C11/00 ,  B01D53/053 ,  F17C13/08

CPC classification number: B01D53/053 ,  B01D53/0407 ,  B01D2253/102 ,  B01D2253/304 ,  B01D2253/342 ,  B01D2257/40 ,  B01D2257/704 ,  B01D2257/706 ,  B01D2257/93 ,  B01D2258/0216 ,  B01D2259/4525 ,  F17C11/00 ,  F17C13/084 ,  F17C2201/0157 ,  F17C2205/0103 ,  F17C2205/0338 ,  F17C2205/0391 ,  F17C2270/0518 ,  Y02E60/321 ,  Y10T137/0318

Abstract: A fluid storage and dispensing apparatus including a fluid storage and dispensing vessel having a rectangular parallelepiped shape, and an integrated gas cabinet assembly including such fluid storage and dispensing apparatus and/or a point-of-use ventilation gas scrubber in the vented gas cabinet. By the use of physical adsorbent and chemical sorbent media, the gas cabinet can be enhanced in safety of operation, e.g., where the process gas supplied from the gas cabinet is of a toxic or otherwise hazardous character.

公开(公告)号：US09132412B2

公开(公告)日：2015-09-15

申请号：US14035834

申请日：2013-09-24

Applicant: Entegris, Inc.

Inventor： J. Donald Carruthers ,  Karl Boggs ,  Luping Wang ,  Shaun M. Wilson ,  Jose I. Arno ,  Paul J. Marganski ,  Steven M. Bilodeau ,  Peng Zou ,  Brian Bobita ,  Joseph D. Sweeney ,  Douglas Edwards

IPC: B01J20/26 ,  B01J20/28 ,  F25B17/08 ,  F25B27/00 ,  F25B35/04 ,  B01J20/20 ,  B01J20/30 ,  C09K5/04 ,  F25B37/00

CPC classification number: B01J20/26 ,  B01J20/20 ,  B01J20/28054 ,  B01J20/28092 ,  B01J20/30 ,  B01J20/305 ,  B01J20/3078 ,  B01J2220/445 ,  C09K5/047 ,  F25B17/08 ,  F25B27/007 ,  F25B35/04 ,  F25B37/00 ,  F25B2500/01

Abstract: An adsorption structure is described that includes at least one adsorbent member formed of an adsorbent material and at least one porous member provided in contact with a portion of the adsorbent member to allow gas to enter and exit the portion of the adsorbent member. Such adsorption structure is usefully employed in adsorbent-based refrigeration systems. A method also is described for producing an adsorbent material, in which a first polymeric material provided having a first density and a second polymeric material is provided having a second density, in which the second polymeric material is in contact with the first polymeric material to form a structure. The structure is pyrolyzed to form a porous adsorbent material including a first region corresponding to the first polymeric material and a second region corresponding to the second polymeric material, in which at least one of the pore sizes and the pore distribution differs between the first region and the second region.

Abstract translation: 描述了吸附结构，其包括由吸附剂材料形成的至少一个吸附构件和与吸附构件的一部分接触设置的至少一个多孔构件，以允许气体进入和离开吸附构件的该部分。 这种吸附结构在吸附剂型制冷系统中有用。 还描述了一种用于生产吸附材料的方法，其中提供具有第一密度的第一聚合物材料和第二聚合物材料，其具有第二密度，其中第二聚合物材料与第一聚合物材料接触以形成 一个结构。 该结构被热解以形成多孔吸附材料，其包括对应于第一聚合物材料的第一区域和对应于第二聚合物材料的第二区域，其中孔径和孔分布中的至少一个在第一区域和第 第二个地区。

公开(公告)号：US20140329025A1

公开(公告)日：2014-11-06

申请号：US14335897

申请日：2014-07-19

Applicant: Entegris, Inc.

Inventor： John M. Cleary ,  Jose I. Arno ,  Bryan C. Hendrix ,  Donn Naito ,  Scott Battle ,  John N. Gregg ,  Michael J. Wodjenski ,  Chongying Xu

IPC: C23C16/448 ,  C23C16/455 ,  C23C14/48

CPC classification number: C23C16/4481 ,  C23C14/48 ,  C23C16/08 ,  C23C16/16 ,  C23C16/18 ,  C23C16/30 ,  C23C16/4402 ,  C23C16/45525 ,  C23C16/45544

Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.

Abstract translation: 挥发易于产生颗粒的源试剂的源试剂的装置和方法，其中通过蒸气发生系统的结构或加工特征抑制了这种颗粒产生或存在的相应源试剂蒸气。 这种装置和方法适用于液体和固体源试剂，特别是固体源试剂如金属卤化物，例如氯化铪。 一种具体实施方案中的源试剂由源试剂材料的多孔整体块形式构成。 本发明的装置和方法有用地用于提供用于例如原子层沉积（ALD）和离子注入的应用的源试剂蒸气。

公开(公告)号：US20150306537A1

公开(公告)日：2015-10-29

申请号：US14746776

申请日：2015-06-22

Applicant: Entegris, Inc.

Inventor： Dennis Brestovansky ,  Michael J. Wodjenski ,  Jose I. Arno ,  J. Donald Carruthers ,  Philip A. Moroco

IPC: B01D53/053 ,  F17C11/00 ,  F17C13/08

CPC classification number: B01D53/053 ,  B01D53/0407 ,  B01D2253/102 ,  B01D2253/304 ,  B01D2253/342 ,  B01D2257/40 ,  B01D2257/704 ,  B01D2257/706 ,  B01D2257/93 ,  B01D2258/0216 ,  B01D2259/4525 ,  F17C11/00 ,  F17C13/084 ,  F17C2201/0157 ,  F17C2205/0103 ,  F17C2205/0338 ,  F17C2205/0391 ,  F17C2270/0518 ,  Y02E60/321 ,  Y10T137/0318

Abstract: A fluid storage and dispensing apparatus including a fluid storage and dispensing vessel having a rectangular parallelepiped shape, and an integrated gas cabinet assembly including such fluid storage and dispensing apparatus and/or a point-of-use ventilation gas scrubber in the vented gas cabinet. By the use of physical adsorbent and chemical sorbent media, the gas cabinet can be enhanced in safety of operation, e.g., where the process gas supplied from the gas cabinet is of a toxic or otherwise hazardous character.

公开(公告)号：US10895010B2

公开(公告)日：2021-01-19

申请号：US15334040

申请日：2016-10-25

Applicant: Entegris, Inc.

Inventor： John M. Cleary ,  Jose I. Arno ,  Bryan C. Hendrix ,  Donn Naito ,  Scott Battle ,  John N. Gregg ,  Michael J. Wodjenski ,  Chongying Xu

IPC: C23C16/448 ,  C23C16/44 ,  C23C14/48 ,  C23C16/455 ,  C23C16/08 ,  C23C16/16 ,  C23C16/18 ,  C23C16/30

Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.

公开(公告)号：US20170037511A1

公开(公告)日：2017-02-09

申请号：US15334040

申请日：2016-10-25

Applicant: Entegris, Inc.

Inventor： John M. Cleary ,  Jose I. Arno ,  Bryan C. Hendrix ,  Donn Naito ,  Scott Battle ,  John N. Gregg ,  Michael J. Wodjenski ,  Chongying Xu

IPC: C23C16/448 ,  C23C16/455 ,  C23C16/30 ,  C23C16/16 ,  C23C16/18 ,  C23C14/48 ,  C23C16/08

CPC classification number: C23C16/4481 ,  C23C14/48 ,  C23C16/08 ,  C23C16/16 ,  C23C16/18 ,  C23C16/30 ,  C23C16/4402 ,  C23C16/45525 ,  C23C16/45544

Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.

Abstract translation: 挥发易于产生颗粒的源试剂的源试剂的装置和方法，其中通过蒸气发生系统的结构或加工特征抑制了这种颗粒产生或存在的相应源试剂蒸气。 这种装置和方法适用于液体和固体源试剂，特别是固体源试剂如金属卤化物，例如氯化铪。 一种具体实施方案中的源试剂由源试剂材料的多孔整体块形式构成。 本发明的装置和方法有用地用于提供用于例如原子层沉积（ALD）和离子注入的应用的源试剂蒸气。

公开(公告)号：US20160281238A1

公开(公告)日：2016-09-29

申请号：US15156421

申请日：2016-05-17

Applicant: Entegris, Inc.

Inventor： Jose I. Arno ,  Joseph R. Despres ,  Shkelqim Letaj ,  Steven M. Lurcott ,  Thomas H. Baum ,  Peng Zou

IPC: C23C16/52 ,  C23C16/455

CPC classification number: C23C16/52 ,  C23C16/14 ,  C23C16/455 ,  G01N21/3504

Abstract: Apparatus and method for monitoring a vapor deposition installation in which a gas mixture can undergo gas phase nucleation (GPN) and/or chemically attack the product device, under process conditions supportive of such behavior. The apparatus includes a radiation source arranged to transmit source radiation through a sample of the gas mixture, and a thermopile detector assembly arranged to receive output radiation resulting from interaction of the source radiation with the gas mixture sample, and to responsively generate an output indicative of onset of the gas phase nucleation and/or chemical attack when such onset occurs. Such monitoring apparatus and methodology is useful in tungsten CVD processing to achieve high rate tungsten film growth without GPN or chemical attack.

Abstract translation: 用于监测气相沉积装置的装置和方法，其中气体混合物可以在支持这种行为的工艺条件下经历气相成核（GPN）和/或化学侵蚀产品装置。 该装置包括被布置成通过气体混合物的样本传送源辐射的辐射源，以及布置成接收由源辐射与气体混合物样品的相互作用产生的输出辐射的热电堆检测器组件，并且响应地产生指示 发生这种发生时气相成核和/或化学侵蚀的发生。 这种监测装置和方法在钨CVD处理中可用于实现无GPN或化学侵蚀的高速钨膜生长。

公开(公告)号：US09455147B2

公开(公告)日：2016-09-27

申请号：US13726826

申请日：2012-12-26

Applicant: Entegris, Inc.

Inventor： W. Karl Olander ,  Jose I. Arno ,  Robert Kaim

IPC: C23C14/48 ,  H01L21/265 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01L21/265 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/006 ,  H01J2237/082 ,  H01L21/26513 ,  H01L21/2658

Abstract: Methods of implanting boron-containing ions using fluorinated boron-containing dopant species that are more readily cleaved than boron trifluoride. A method of manufacturing a semiconductor device including implanting boron-containing ions using fluorinated boron-containing dopant species that are more readily cleaved than boron trifluoride. Also disclosed are a system for supplying a boron hydride precursor, and methods of forming a boron hydride precursor and methods for supplying a boron hydride precursor. In one implementation of the invention, the boron hydride precursors are generated for cluster boron implantation, for manufacturing semiconductor products such as integrated circuitry.

公开(公告)号：US20130092263A1

公开(公告)日：2013-04-18

申请号：US13707109

申请日：2012-12-06

Applicant: Entegris, Inc. ,  Advanced Technology Materials Incorporated

Inventor： Anthony DiPrizio ,  Paul Matthews ,  Jose I. Arno

IPC: F16L55/24

CPC classification number: F16L55/24 ,  B01D65/00 ,  B01D65/003 ,  B01D69/10 ,  B01D71/36 ,  B01D2313/20 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/0344 ,  F17C2205/0391 ,  Y10T137/794

Abstract: The present invention provides a fluid filter utilizing a polymeric membrane supports by metallic screens contained in a housing. The supports have apertures through which fluid can pass. The metallic supports are created such that they have at least one surface substantially free from burrs, so as not to damage the membrane. This smooth surface is in communication with the polymeric membrane. One or more indexing protrusions can be added along the circumference to restrict the relative movement between the supports, and to align the apertures of the two supports.

Abstract translation: 本发明提供了一种利用包含在壳体中的金属筛网利用聚合物膜支架的流体过滤器。 支撑件具有流体可以通过的孔。 制造金属支撑体使得它们具有至少一个基本上没有毛刺的表面，以便不损坏膜。 该光滑表面与聚合物膜连通。 可以沿着圆周添加一个或多个分度突起，以限制支撑件之间的相对运动并且对准两个支撑件的孔。