SYSTEMS AND METHODS FOR PERFORMING SAMPLE LIFT-OUT FOR HIGHLY REACTIVE MATERIALS

    公开(公告)号:US20250095953A1

    公开(公告)日:2025-03-20

    申请号:US18970226

    申请日:2024-12-05

    Applicant: FEI COMPANY

    Abstract: Methods and systems for performing sample lift-out and creating attachments for highly reactive materials within charged particle microscopy systems are disclosed herein. Methods include creating attachments between a sample manipulator and a sample within a charged particle system and translating a sample manipulator so that the sample manipulator is proximate to a sample such that a portion of the sample manipulator proximate to the sample is composed of a high sputter yield material. The methods and systems include milling, with a charged particle beam, the high sputter yield material such that portions of the high sputter yield material are removed from the sample manipulator without milling away material from the sample such that at least some of the removed high sputter yield material redeposits to form an attachment between the sample manipulator and the sample without milling material away from the sample.

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