公开(公告)号：US20230206489A1

公开(公告)日：2023-06-29

申请号：US17561554

申请日：2021-12-23

Applicant: FEI Company

Inventor： Jan STOPKA ,  Bohuslav SED'A ,  Radovan VASINA ,  Radim SEJNOHA

IPC: G06T7/73 ,  G06T7/37 ,  G06T7/33

CPC classification number: G06T7/74 ,  G06T7/37 ,  G06T7/337 ,  G06T2207/10061

Abstract: Methods and systems to determine positions of multiple beamlets includes performing a first scan by scanning the beamlets over a first sample region and acquiring multiple cell images; and performing a second scan by scanning the beamlets over a second sample region and acquiring multiple cell images. Each cell image corresponds to a beamlet, and at least a part of an overlapped region between the first sample region and the second sample region is scanned by multiple beamlets during both the first scan and the second scan. Position of each beamlet may then be determined based on the corresponding cell images acquired during the first scan and the second scan.

公开(公告)号：US20230317405A1

公开(公告)日：2023-10-05

申请号：US17709025

申请日：2022-03-30

Applicant: FEI Company

Inventor： Jan STOPKA ,  Bohuslav SED'A ,  Radovan VASINA ,  Radim SEJNOHA

IPC: H01J37/153 ,  G06T7/70 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/153 ,  G06T7/70 ,  H01J37/28 ,  H01J37/244 ,  H01J2237/1534

Abstract: The beamlets in a multi-beam microscopy system are aligned based on coefficients of a fitted aberration model. In particular, an illuminator for directing the beamlets towards the sample is adjusted based on the coefficients to correct the aberrations. The coefficients are obtained based on measured beamlets' positions in the sample plane.