公开(公告)号：US20130126213A1

公开(公告)日：2013-05-23

申请号：US13741818

申请日：2013-01-15

Applicant: FUJIFILM CORPORATION

Inventor： Toyomi MATSUDA ,  Makoto SUTOU ,  Tomonori BABA ,  Daisuke MITSUHASHI

IPC: H01B5/00

CPC classification number: H01B5/00 ,  G03F1/14 ,  H05K1/0393 ,  H05K3/0082 ,  H05K3/106 ,  H05K2201/0108 ,  H05K2201/09681 ,  H05K2203/056 ,  H05K2203/1545 ,  Y10T428/24917 ,  Y10T428/24997

Abstract: There are provided a pattern exposure method, a conductive film producing method, and a conductive film, wherein a photosensitive material is subjected to a proximity exposure through a photomask disposed with a proximity gap of 70 to 200 μm, and thereby is exposed in the mask pattern periodically in the conveying direction to obtain a conductive film. The conductive film has a plurality of conductive portions of first and second conductive thin metal wires and a plurality of opening portions. A side of each thin metal wire has a protrusion extending toward the opening portion from a virtual line representing a designed width of the thin metal wire, and the protruding amount of the protrusion is 1/25 to ⅙ of the designed width.

Abstract translation: 提供了图案曝光方法，导电膜制造方法和导电膜，其中感光材料通过设置有70至200μm的邻近间隙的光掩模进行接近曝光，从而暴露于掩模 沿输送方向周期性地形成导电膜。 导电膜具有第一导电薄金属线和第二导电薄金属线的多个导电部分和多个开口部。 每个细金属丝的一侧具有从表示薄金属线的设计宽度的虚拟线向开口部延伸的突起，突起的突出量为设计宽度的1/25至1/6。