公开(公告)号：US20140023793A1

公开(公告)日：2014-01-23

申请号：US14034048

申请日：2013-09-23

Applicant: FUJIFILM Corporation

Inventor： Toyomi MATSUDA ,  Keio OKANO

IPC: H05K9/00

CPC classification number: H05K9/0081 ,  C23C18/06 ,  C23C18/14 ,  H01L31/188 ,  Y02E10/50

Abstract: A conductive film producing method according to the present invention contains a conductive metal portion forming step of forming a conductive metal portion containing a conductive substance and a binder on a support, and a vapor contact step of bringing the conductive metal portion into contact with a superheated vapor. This method may further contain a smoothing treatment step of smoothing the conductive metal portion, such that the smoothed conductive metal portion is brought into contact with the superheated vapor in the vapor contact step.

Abstract translation: 根据本发明的导电膜制造方法包括导电金属部分形成步骤，在载体上形成含有导电物质和粘合剂的导电金属部分，以及使导电金属部分与过热的导电金属部分接触的气相接触步骤 汽。 该方法还可以包括使导电金属部分平滑的平滑化处理步骤，使得平滑的导电金属部分在蒸汽接触步骤中与过热蒸汽接触。

公开(公告)号：US20130126213A1

公开(公告)日：2013-05-23

申请号：US13741818

申请日：2013-01-15

Applicant: FUJIFILM CORPORATION

Inventor： Toyomi MATSUDA ,  Makoto SUTOU ,  Tomonori BABA ,  Daisuke MITSUHASHI

IPC: H01B5/00

CPC classification number: H01B5/00 ,  G03F1/14 ,  H05K1/0393 ,  H05K3/0082 ,  H05K3/106 ,  H05K2201/0108 ,  H05K2201/09681 ,  H05K2203/056 ,  H05K2203/1545 ,  Y10T428/24917 ,  Y10T428/24997

Abstract: There are provided a pattern exposure method, a conductive film producing method, and a conductive film, wherein a photosensitive material is subjected to a proximity exposure through a photomask disposed with a proximity gap of 70 to 200 μm, and thereby is exposed in the mask pattern periodically in the conveying direction to obtain a conductive film. The conductive film has a plurality of conductive portions of first and second conductive thin metal wires and a plurality of opening portions. A side of each thin metal wire has a protrusion extending toward the opening portion from a virtual line representing a designed width of the thin metal wire, and the protruding amount of the protrusion is 1/25 to ⅙ of the designed width.

Abstract translation: 提供了图案曝光方法，导电膜制造方法和导电膜，其中感光材料通过设置有70至200μm的邻近间隙的光掩模进行接近曝光，从而暴露于掩模 沿输送方向周期性地形成导电膜。 导电膜具有第一导电薄金属线和第二导电薄金属线的多个导电部分和多个开口部。 每个细金属丝的一侧具有从表示薄金属线的设计宽度的虚拟线向开口部延伸的突起，突起的突出量为设计宽度的1/25至1/6。