公开(公告)号：US20180188650A1

公开(公告)日：2018-07-05

申请号：US15906778

申请日：2018-02-27

Applicant: FUJIFILM Corporation

Inventor： Michihiro OGAWA ,  Hideki TAKAKUWA ,  Hisamitsu TOMEBA

IPC: G03F7/033 ,  C09D133/16 ,  C08F220/22 ,  C08F220/28 ,  G03F7/031 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/00 ,  H01L27/146 ,  H01L27/148 ,  G02B1/04

Abstract: An object of the present invention is to provide a curable composition satisfying both of excellent low reflectivity and excellent developability, a method for producing a cured film, an infrared color filter provided with a light-shielding film, and a solid-state imaging device.The curable composition of the present invention includes a fluorine-containing polymer including a repeating unit represented by Formula (A) and a repeating unit represented by Formula (B), a polymerizable compound, and a coloring agent. In Formula (A), R1 represents a hydrogen atom or an alkyl group, and L1 represents a divalent chained linking group having 3 or more carbon atoms in total, which may include an ester bond.In Formula (B), R2 represents a hydrogen atom or an alkyl group, L2 represents a single bond or a divalent linking group, and Rf represents a monovalent organic group including an fluorine atom.

公开(公告)号：US20190113840A1

公开(公告)日：2019-04-18

申请号：US16211715

申请日：2018-12-06

Applicant: FUJIFILM Corporation

Inventor： Hisamitsu TOMEBA ,  Kaoru AOYAGI

IPC: G03F7/00 ,  G02B1/04 ,  G03F7/038 ,  G03F7/039 ,  G03F7/033 ,  G03F7/031 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40

Abstract: Provided are a coloring composition capable of producing a film with suppressed occurrence of striation, and a method for producing a film. The coloring composition includes a coloring agent A, a resin B, a polymerizable compound C, a photopolymerization initiator D, and an organic solvent E, in which the organic solvent E includes an ester-based solvent E1 having a surface tension at 25° C. of from 25 mN/m to 35 mN/m, an organic solvent E2 having a surface tension at 25° C. of less than 25 mN/m, a ratio of a mass of the ester-based solvent E1 to the mass of the organic solvent E2 is 80:20 to 30:70 in terms of the ratio of the mass of the ester-based solvent E1:the mass of the organic solvent E2, and the organic solvent E contains 50% by mass or more of a combination of the ester-based solvent E1 and the organic solvent E2 with respect to the total mass of the organic solvent E.

公开(公告)号：US20150372037A1

公开(公告)日：2015-12-24

申请号：US14840160

申请日：2015-08-31

Applicant: FUJIFILM CORPORATION

Inventor： Hisamitsu TOMEBA

IPC: H01L27/146

CPC classification number: H01L27/14621 ,  G02B5/223 ,  H01L27/14618 ,  H01L27/14627 ,  H01L27/14636 ,  H01L27/14645 ,  H01L27/14685 ,  H04N5/2254 ,  H04N5/2257 ,  H04N9/045

Abstract: A solid-state image sensor includes a semiconductor substrate, photoelectric conversion elements arranged on a light receiving surface side of the semiconductor substrate and making up pixels, and a filter layer disposed on a light incidence side of the photoelectric conversion elements so as to correspond to the photoelectric conversion elements. The filter layer includes at least red color filters, green color filters, blue color filters and infrared cut-off filters. The infrared cut-off filters are each arranged next to at least one of the red color filters, the green color filters and the blue color filters. The solid-state image sensor suppresses occurrence of deterioration of the spectral characteristics of an adjacent color filter of any of three primary colors.

Abstract translation: 固态图像传感器包括半导体衬底，布置在半导体衬底的光接收表面侧上的光电转换元件和构成像素，以及设置在光电转换元件的光入射侧的滤光层，以对应于 光电转换元件。 滤色层至少包括红色滤色片，绿色滤色片，蓝色滤色片和红外截止滤光片。 红外截止滤光片分别设置在红色滤色器，绿色滤色器和蓝色滤色器中的至少一个旁边。 固态图像传感器抑制三原色中的任一种的相邻滤色器的光谱特性的劣化的发生。

公开(公告)号：US20140332713A1

公开(公告)日：2014-11-13

申请号：US14337301

申请日：2014-07-22

Applicant: FUJIFILM Corporation

Inventor： Atsushi MIZUTANI ,  Hisamitsu TOMEBA ,  Kazutaka TAKAHASHI ,  Tadashi INABA

IPC: C23F1/26 ,  H05K3/06

CPC classification number: C23F1/26 ,  C23F1/44 ,  H01L21/32134 ,  H01L24/03 ,  H01L24/05 ,  H01L24/13 ,  H01L2224/0345 ,  H01L2224/0346 ,  H01L2224/03614 ,  H01L2224/03912 ,  H01L2224/0401 ,  H01L2224/05027 ,  H01L2224/05082 ,  H01L2224/05166 ,  H01L2224/05559 ,  H01L2224/05572 ,  H01L2224/05647 ,  H01L2224/13082 ,  H01L2224/13111 ,  H01L2224/13155 ,  H01L2924/00014 ,  H01L2924/12041 ,  H05K3/067 ,  H05K3/108 ,  H01L2924/01074 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01082 ,  H01L2924/00 ,  H01L2224/05552

Abstract: An etching method having the step of: applying an etching liquid to a substrate, the etching liquid containing: a fluorine ion, a nitrogen-containing compound having at least 2 of nitrogen-containing structural units, and water, the etching liquid having a pH of being adjusted to 5 or less; and etching a titanium compound in the substrate.

Abstract translation: 一种蚀刻方法，具有以下步骤：向基板施加蚀刻液，所述蚀刻液含有氟离子，至少含有2个含氮结构单元的含氮化合物和水，所述蚀刻液具有pH 调整为5以下; 并在基板中蚀刻钛化合物。

公开(公告)号：US20170166762A1

公开(公告)日：2017-06-15

申请号：US15444661

申请日：2017-02-28

Applicant: FUJIFILM Corporation

Inventor： Hisamitsu TOMEBA

IPC: C09D5/32 ,  C09D133/10 ,  H01L27/146 ,  G03F7/16 ,  G02B5/20 ,  G03F7/32 ,  G03F7/40 ,  G03F7/031 ,  G03F7/033 ,  C09D133/00 ,  G03F7/20

CPC classification number: C09D5/32 ,  C08F2/44 ,  C08F2/50 ,  C08K5/06 ,  C08K5/10 ,  C08K2003/2258 ,  C09D4/00 ,  C09D7/20 ,  C09D7/61 ,  C09D133/00 ,  C09D133/06 ,  C09D133/10 ,  C09D201/00 ,  G02B5/208 ,  G02B5/22 ,  G03F7/0007 ,  G03F7/0047 ,  G03F7/0048 ,  G03F7/027 ,  G03F7/031 ,  G03F7/033 ,  G03F7/0388 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/322 ,  G03F7/40 ,  H01L27/14 ,  H01L27/14621 ,  H01L27/14623

Abstract: The invention relates to provide an infrared shielding composition that can form an infrared cut filter in which flat coating properties are excellent and the generation of a pattern on the surface is suppressed and that has excellent drying resistance, an infrared cut filter, and a solid-state imaging device. The infrared shielding composition according to the invention includes at least metal containing tungsten oxide particles; a resin binder; a solvent A of which a boiling point is 170° C. to 200° C. at 1 atm; and a solvent B different from the solvent A, in which a content of the solvent A is 0.1 to 20 mass % with respect to a total mass of the infrared shielding composition.

公开(公告)号：US20160327865A1

公开(公告)日：2016-11-10

申请号：US15212936

申请日：2016-07-18

Applicant: FUJIFILM Corporation

Inventor： Daisuke KASHIWAGI ,  Takeshi ANDOU ,  Satoru YAMADA ,  Yasumasa KAWABE ,  Hisamitsu TOMEBA

IPC: G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  H01L51/52 ,  G02B5/20 ,  G02B5/22 ,  G02F1/1335 ,  G03F7/00 ,  G03F7/32

CPC classification number: G03F7/0397 ,  C08F212/14 ,  C08F220/10 ,  C09B55/002 ,  G02B5/20 ,  G02B5/206 ,  G02B5/208 ,  G02B5/223 ,  G02F1/133516 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/168 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  H01L27/14621 ,  H01L27/14623 ,  H01L27/322 ,  H01L51/5253 ,  H01L51/5284

Abstract: Provided is a photosensitive resin composition from which a cured product having thin film thickness, excellent light-shielding properties, and high surface hardness is obtained. A a cured film and a method for producing the same, a method for producing a resin pattern, and an LCD device, an organic EL display device, an infrared cut filter, or a solid-state imaging device are also provided. The photosensitive resin composition includes a polymer component including at least one of categories (1) or (2), a photoacid generator, a solvent, and titanium black, wherein (1) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group, and (2) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group.

Abstract translation: 提供了一种感光性树脂组合物，其具有薄膜厚度，优异的遮光性和高表面硬度的固化产物。 还提供了固化膜及其制造方法，树脂图案的制造方法，以及LCD装置，有机EL显示装置，红外截止滤光器或固态成像装置。 感光性树脂组合物包括含有（1）或（2）类中的至少一种的光聚合物成分，光致酸产生剂，溶剂和钛黑，其中（1）包括（a1）包含其中 酸基被酸分解基团保护，（a2）含有交联基团的结构单元，（2）包括（a1）含有酸基被酸分解基团保护的基团的结构单元 ，（a2）含有交联性基团的结构单元。

公开(公告)号：US20160320529A1

公开(公告)日：2016-11-03

申请号：US15209870

申请日：2016-07-14

Applicant: FUJIFILM Corporation

Inventor： Daisuke KASHIWAGI ,  Takeshi ANDOU ,  Satoru YAMADA ,  Yasumasa KAWABE ,  Hisamitsu TOMEBA

IPC: G02B1/04 ,  G02B5/22 ,  G02F1/1335 ,  C08F220/16 ,  C08F220/36 ,  H01L51/00 ,  C08F220/28 ,  C08F212/14 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/00 ,  H01L27/32 ,  H01L51/52 ,  H01L27/146 ,  H01L51/56 ,  G02B5/20

CPC classification number: G02B1/04 ,  C08F212/14 ,  C08F220/16 ,  C08F220/18 ,  C08F220/28 ,  C08F220/36 ,  C08F2220/281 ,  C08F2220/365 ,  G02B5/206 ,  G02B5/208 ,  G02B5/223 ,  G02F1/1335 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/168 ,  G03F7/20 ,  G03F7/322 ,  G03F7/40 ,  H01L27/14621 ,  H01L27/14623 ,  H01L27/14685 ,  H01L27/322 ,  H01L51/004 ,  H01L51/0043 ,  H01L51/5284 ,  H01L51/56

Abstract: Provided are a photosensitive resin composition from which a cured product having a thin film thickness, excellent light-shielding properties, and a high surface hardness is obtained; as well as a cured product obtained by curing the photosensitive resin composition, a cured film and a method for producing the same, a method for producing a resin pattern, and a liquid crystal display device, an organic EL display device, an infrared cut filter, or a solid-state imaging device, each having the cured film. The photosensitive resin composition of the present invention includes (Component A) a polymer having a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group; (Component B) a photoacid generator; (Component C) a solvent; (Component D) a compound having a crosslinkable group and a molecular weight in the range of 100 to 2,000; and (Component S) titanium black.

Abstract translation: 提供一种感光性树脂组合物，其具有薄膜厚度，优异的遮光性和高的表面硬度的固化产物; 以及通过固化感光性树脂组合物得到的固化物，固化膜及其制造方法，树脂图案的制造方法以及液晶显示装置，有机EL显示装置，红外线截止滤光片 ，或固态成像装置，每个具有固化膜。 本发明的感光性树脂组合物包含（成分A）具有含有酸基被酸分解基团保护的基团的结构单元的聚合物; （组分B）光致酸发生剂; （组分C）溶剂; （组分D）具有交联基团和分子量在100至2,000范围内的化合物; 和（组分S）钛黑。